Cutting fluid for cutting large-size silicon wafer by diamond wire and preparation process of cutting fluid

A diamond wire cutting, large-size technology, applied in the petroleum industry, lubricating compositions, etc., can solve the problems of rising, cutting fluid can not effectively disperse cutting efficiency, low abnormal rate and contamination rate, etc., to avoid cutting accuracy , Improve lubricity and penetration, reduce damage

Pending Publication Date: 2021-06-15
JINWAN GAOJING SOLAR ENERGY TECH CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The technical problem to be solved by the present invention is: the existing cutting fluid cannot effectively disperse the silicon powder produced during the cutting process of large-size silicon wafers, resulting in low cutting efficiency and increased abnormality rate and contamination rate

Method used

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  • Cutting fluid for cutting large-size silicon wafer by diamond wire and preparation process of cutting fluid
  • Cutting fluid for cutting large-size silicon wafer by diamond wire and preparation process of cutting fluid
  • Cutting fluid for cutting large-size silicon wafer by diamond wire and preparation process of cutting fluid

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Experimental program
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Effect test

Embodiment 1

[0024] Embodiment 1: A cutting fluid for diamond wire cutting large-size silicon wafers in the preferred embodiment of the present embodiment, in terms of mass fraction, includes: 4.35 kg of triethanolamine oleate, 1.73 kg of tributyl oleate, polyethylene glycol 8.70kg, oleic acid 0.87kg, borax 2.61kg, triethanolamine borate 13.04kg, sodium benzoate 0.87kg, fatty alcohol polyoxyethylene ether 2.61kg, lauryl ether phosphate 1.74kg, propylene glycol block polyether 1.74kg, Nitrilotriacetic acid 0.87kg, deionized water 60kg.

Embodiment 2

[0025] Embodiment 2: A kind of cutting fluid for diamond wire cutting large-size silicon wafers in the preferred embodiment of the present embodiment, in mass fraction, includes: 2.33 kg of triethanolamine oleate, 0.93 kg of tributyl oleate, polyethylene glycol 7.76kg, oleic acid 0.66kg, borax 0.52kg, triethanolamine borate 9.31kg, sodium benzoate 0.62kg, fatty alcohol polyoxyethylene ether 2.33kg, lauryl ether phosphate 1.65kg, propylene glycol block polyether 2.12kg, Nitrilotriacetic acid 0.57kg, deionized water 71.2kg.

Embodiment 3

[0026] Embodiment 3: A kind of cutting fluid for diamond wire cutting large-size silicon wafers in the preferred embodiment of the present embodiment, in terms of mass fraction, includes: 2.49 kg of triethanolamine oleate, 1.58 kg of tributyl oleate, polyethylene glycol 12.88kg, oleic acid 0.74kg, borax 0.96kg, triethanolamine borate 8.39kg, sodium benzoate 0.73kg, fatty alcohol polyoxyethylene ether 4.94kg, propylene glycol block polyether 0.90kg, nitrilotriacetic acid 1.00kg, deionized 65.40kg of water.

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Abstract

The invention relates to the technical field of cutting fluids, and discloses a cutting fluid for cutting a large-size silicon wafer by a diamond wire and a preparation process of the cutting fluid. The cutting fluid comprises the following components in parts by mass: a defoaming agent, a wetting agent and a lubricating agent are compounded, so that the lubricity and seepage force of the cutting fluid are improved, and the cutting fluid can permeate into a space between a wire net of a diamond wire and a silicon wafer or a space between the wire net and silicon wafer scraps so as to form a layer of lubricating film, so that damage, stress and micro cracks caused by cutting are reduced. Meanwhile, the surface of a large-size silicon wafer which is being cut can be rapidly cooled, micro powder generated in the cutting process can be effectively dispersed into a mixed solution composed of water, a lubricating agent and a wetting agent, and the situation that silicon powder is gathered on the cutting local part, and consequently cutting of the silicon wafer is affected or damaged is avoided.

Description

technical field [0001] The invention relates to the field of cutting fluid technology, in particular to a cutting fluid for diamond wire cutting large-size silicon wafers and a preparation process thereof. Background technique [0002] The existing domestic diamond wire cutting fluid is mainly divided into three types [0003] A, one is the cutting fluid of polyethylene glycol system, as disclosed in patent application CN 102352278A, it is mainly based on polyethylene glycol, adding a certain proportion of antirust agent, emulsifier and defoamer, this cooling The advantage of the liquid is that the cooling effect is better, and it has a certain suspension and chelation effect on impurities such as silicon powder. The disadvantage is that the cost is high and there is a certain degree of environmental pollution. [0004] B, one is a small molecule alcohol, ether, phenol mixed cutting fluid, as disclosed in patent application CN 102433190 A, it mainly uses propylene glycol as...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C10M173/00C10N30/06C10N40/22C10N30/02C10N30/04
CPCC10M173/00C10M2215/042C10M2209/104C10M2207/126C10M2207/281C10M2201/087C10M2227/061C10M2207/141C10M2223/04C10M2209/103C10M2215/04
Inventor 付明全吕炳国
Owner JINWAN GAOJING SOLAR ENERGY TECH CO LTD
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