Preparation method of high-aspect-ratio light trapping structure for surface of silicon thin film battery

Abstract

The invention provides a preparation method of a high-aspect-ratio light trapping structure for the surface of a silicon thin film battery. The preparation method is characterized in that the process flow of the high-depth and wide-pit array structure on the surface of a glass substrate by using a negative photoetching plate comprises the following steps of: (a) sputtering a metal seed layer, and spin-coating photoresist; (b) carrying out photoetching and developing; (c) electroplating nickel metal (Ni); (d) removing photoresist; (e) etching a seed layer; (f) performing reactive ion etching on the glass substrate; (g) etching the glass substrate with hydrofluoric acid (HF); and (h) removing the metal layer. According to the preparation method, the pit array with the high aspect ratio can be prepared on the surface of the glass, and the reflection can be reduced and the optical path can be prolonged. The preparation method can be used for a surface pit array structure, and by adopting the efficient surface light trapping structure, light energy loss on the surface of the cell can be reduced, light energy escape in the cell can be reduced, meanwhile, the light path of light in a cell absorption layer can be prolonged, and therefore the efficiency of the silicon thin film solar cell is improved.

Description

[0001] (1) Technical field [0002] The invention relates to a method for preparing a high-aspect-ratio light-trapping structure used on the surface of a silicon thin-film battery, which can be used to prepare a high-aspect-ratio pit array structure on the glass surface to improve the light-trapping characteristics of the light-trapping structure. The efficient surface light trapping structure can not only reduce the loss of light energy on the surface of the battery, but also reduce the escape of light energy inside the battery, and at the same time extend the optical path of light in the absorbing layer of the battery, thereby improving the efficiency of silicon thin film solar cells. The invention belongs to the field of micro-nano processing, and specifically relates to an etching method combining a dry method and a wet method. [0003] (2) Background technology [0004] Solar cells have the advantages of simple preparation process, large-area preparation and low cost, but ...

AI Technical Summary

Problems solved by technology

As a result, the light trapping characteristics of the glass are restricted, which affects the improvement of battery efficiency.

Moreover, the high cost of laser etching glass is not suitable for mass production; while only using wet etching has poor graphic fidelity, uneven etching and difficult to control; only using ion etching is not accurate enough and expensive

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