Nickel-chromium alloy sputtering target materials and hot isostatic pressing preparation method thereof
A hot isostatic pressing, nickel-chromium alloy technology, applied in sputtering coating, metal material coating process, vacuum evaporation coating, etc. The target material does not meet the sputtering requirements and other problems, so as to achieve the effect of small grain size and uniform internal structure
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[0056] Example 1
[0057] This embodiment provides a thermostatic pressure preparation method of a nickel-chromium alloy sputtering target, the heat and other static pressure preparation method comprising the steps of:
[0058] (1) Prepare the Cr content of 50% by weight of the nickel-chromium alloy powder, load the stainless steel mold, and stronger and sealing in turn;
[0059] Among them, the nickel-chromium alloy powder is mixed with chromium-chromium-chromium-chromium-chromium-chromium-chromium-chromium-chromium-based nickel-chromium-based nickel-chromium alloy powder, and the average particle size of the chromium powder is <100 μm; The mixing is carried out in a mixed powder machine, and the ball zirconium ball mass ratio is 3:10, and 30 h is mixed under argon under argon.
[0060] (2) Put the mold after the step (1), in the heating furnace, heated to 400 ° C, and control the vacuum degree or less, 6h degassing treatment;
[0061] (3) Put the mold after degasses of step (2) ...
Example Embodiment
[0063] Example 2
[0064] This embodiment provides a thermostatic preparation method of a nickel-chromium alloy sputtering target, in addition to the temperature of the heat such as the heat such as step (3) at 950 ° C for 800 ° C, other conditions and Example 1 Otamed.
Example Embodiment
[0065] Example 3
[0066] This embodiment provides a thermostatic pressure preparation method of a nickel-chromium alloy sputtering target, in addition to the temperature of 1,400 ° C, other conditions and Example 1 in addition to the temperature of the heat such as the heat such as step (3). Otamed.
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