Solar blind ultraviolet photoelectric detector and application thereof
A technology of electrical detectors and ultraviolet light, which is applied in the direction of circuits, electrical components, semiconductor devices, etc., can solve the problems of poor spectral selectivity and less spectral selection of detectors, and achieve improved spectral selectivity, high spectral selectivity, and improved stability sexual effect
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Embodiment 1
[0045] The sun-blind ultraviolet detector of the present embodiment adopts such as figure 1 Bottom gate structure shown.
[0046] Substrate 1, gate electrode 2, gate dielectric layer 3, channel layer 4 and cover layer 5 are sequentially made of heavily doped silicon, metal aluminum, silicon oxide, amorphous gallium oxide, aluminum oxide or a stack of aluminum oxide and silicon oxide. layer, the specific film system is Si-Al-SiO 2 -Ga 2 o 3 -Al 2 o 3 (increased anti-reflection layer) and Si-Al-SiO 2 -Ga 2 o 3 -Al 2 o 3 -SiO 2 (anti-reflective layer in laminated form).
[0047] By changing the thickness of different film layers, the reflectance of the film system to light in different bands is simulated by using ellipsometric software, and the reflection gain multiples at 254nm, 320nm and 450nm bands are calculated.
[0048] Finally, the optimal thickness of the film system is obtained respectively, using the Al enhancement layer and the Al 2 o 3 Cover layer: Si(1m...
Embodiment 2
[0057] The sun-blind ultraviolet detector of the present embodiment adopts such as figure 1 Bottom gate structure shown.
[0058] Substrate 1, gate electrode 2, gate dielectric layer 3, channel layer 4, and cover layer 5 are made of heavily doped silicon, metal aluminum, aluminum oxide, amorphous gallium oxide, and aluminum oxide in sequence, and the specific film system is Si-Al -Al 2 o 3 -Ga 2 o 3 -Al 2 o 3 (add anti-reflection layer).
[0059] By changing the thickness of different film layers, the reflectance of the film system to light in different bands is simulated by using ellipsometric software, and the reflection gain multiples at 254nm, 320nm and 450nm bands are calculated.
[0060] The optimal film thickness is Si(1mm)-Al(50nm)-Al 2 o 3 (150nm)-Ga 2 o 3 (190nm)-Al 2 o 3 (20nm). It also includes a comparison film system that does not modify the surface of the channel layer and does not use a metal aluminum layer with an anti-reflection effect, specific...
Embodiment 3
[0069] The sun-blind ultraviolet detector of the present embodiment adopts such as figure 1 Bottom gate structure shown.
[0070] Substrate 1, gate electrode 2, gate dielectric layer 3, channel layer 4, and cover layer 5 are made of heavily doped silicon, metal aluminum, hafnium oxide or stacked layers of silicon oxide and hafnium oxide, amorphous gallium oxide, oxide Lamination of aluminum or aluminum oxide and silicon oxide, the specific film system is Si-Al-HfO 2 -Ga 2 o 3 -Al 2 o 3 (Add anti-reflection layer), Si-Al-HfO 2 -Ga 2 o 3 -SiO 2 -Al 2 o 3 (anti-reflection layer in laminated form) and Si-Al-SiO 2 -HfO 2 -Ga 2 o 3 -SiO 2 -Al 2 o 3 (Gate dielectric layer and anti-reflection layer in stacked form). By changing the thickness of different film layers, the reflectance of the film system to light in different bands is simulated by using ellipsometric software, and the reflection gain multiples at 254nm, 320nm and 450nm bands are calculated. Finally, th...
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