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Photosensitive resist for thermosensitive positive CTP plate, and preparation method thereof

A heat-sensitive positive image and photosensitive adhesive technology, which is applied in the field of photosensitive adhesive of heat-sensitive positive image CTP plate and its preparation, can solve the problems of poor photosensitive performance and development resistance, decreased adhesion, low sensitivity, etc., and achieves improved sensitivity. performance, improved viscosity, good adhesion

Pending Publication Date: 2021-09-21
安徽强邦新材料股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, the photosensitive adhesive of the current thermal positive CTP plate has low sensitivity to infrared laser exposure, poor photosensitive performance and development resistance, and low viscosity, decreased adhesion, and cannot adhere well to the plate base. , for this reason we propose a kind of photosensitive glue and its preparation method for thermal positive CTP plate to solve the above problems

Method used

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  • Photosensitive resist for thermosensitive positive CTP plate, and preparation method thereof
  • Photosensitive resist for thermosensitive positive CTP plate, and preparation method thereof
  • Photosensitive resist for thermosensitive positive CTP plate, and preparation method thereof

Examples

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Effect test

Embodiment 1

[0047] The present embodiment is cement, and the preparation method of described cement is as follows:

[0048] S1: Add dimethyl carbonate, aniline and anhydrous zinc acetate into a four-necked flask equipped with a stirrer and a condensing reflux tube, heat to boiling and reflux for 6 hours, cool to room temperature after the reaction, and vacuum filter the reaction product , the filtrate was distilled under reduced pressure to precipitate crystals, the crystals were washed twice with deionized water, placed in a vacuum drying oven, and dried to a constant weight at a temperature of 30°C to obtain intermediate 1; The dosage ratio of methyl ester, aniline and anhydrous zinc acetate is 30mL: 6mL: 0.3g;

[0049] S2: Add intermediate 1 and hydrochloric acid solution into a four-necked flask equipped with a stirrer and a condensing reflux tube, heat up to 80°C, control the heating rate at 1°C / min, then add formaldehyde solution, and then stir at a speed of Under the condition of ...

Embodiment 2

[0053] The present embodiment is cement, and the preparation method of described cement is as follows:

[0054] S1: Add dimethyl carbonate, aniline and anhydrous zinc acetate into a four-necked flask equipped with a stirrer and a condensing reflux tube, heat to boiling and reflux for 8 hours, cool to room temperature after the reaction, and vacuum filter the reaction product , the filtrate was distilled under reduced pressure to precipitate crystals, the crystals were washed 3 times with deionized water, placed in a vacuum drying oven, and dried to a constant weight at a temperature of 40°C to obtain intermediate 1; The dosage ratio of methyl ester, aniline and anhydrous zinc acetate is 30mL: 6mL: 0.3g;

[0055] S2: Add intermediate 1 and hydrochloric acid solution into a four-necked flask equipped with a stirrer and a condensing reflux tube, heat up to 80°C, control the heating rate to 3°C / min, then add formaldehyde solution, and then stir at a speed of React at a constant t...

Embodiment 3

[0059] This embodiment is a method for preparing a photosensitive adhesive for a thermal positive CTP plate, comprising the following steps:

[0060] Step 1, preparation of infrared absorber:

[0061] A1. Preparation of aqueous dispersion: Add sodium polystyrene sulfonate and water into the reaction kettle and stir to dissolve, add 3,4-ethylenedioxythiophene, ferric chloride and potassium persulfate under stirring conditions, and dissolve at 60°C Undergo reaction 1h, obtain water dispersion liquid, standby;

[0062] A2. Preparation of infrared light absorber: add the water dispersion into the dispersing bucket, add nanometer metal oxide, and disperse with ultrasonic waves to obtain the infrared light absorber evenly, and set aside;

[0063] Step two, glue preparation:

[0064] Add matrix resin, film-forming resin, and binder from Example 1 into the reactor, heat to 80°C, stir at 800r / min, and add initiator, antioxidant, solubilizer, stabilizer, The chemical reaction between...

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Abstract

The invention discloses a photosensitive resist for a thermosensitive positive CTP plate, and a preparation method thereof, and relates to the field of CTP plate materials. The photosensitive resist is formed by starting from a photosensitive layer of the CTP plate, taking matrix resin and film-forming resin as main raw materials, and well proportioning the main raw materials with other raw materials; a cementing agent is prepared in the process of preparing the photo-sensitive adhesive, polyether triol is a high polymer material with the characteristics of better mechanical property, adhesive property, thermal oxidation resistance, light resistance and the like, but the polyether triol has a large number of hydroxyl groups and is high in water absorption and poor in hydrolytic stability, and the hydroxyl groups are terminated after the reaction of isocyanate groups, so that the problem of poor hydrolytic stability is solved, good adhesion is retained, the adhesion of the photosensitive adhesive can be improved, and the problem that the photosensitive property of the photosensitive adhesive is influenced due to low adhesive force is solved.

Description

technical field [0001] The invention relates to the field of CTP plate materials, in particular to a photosensitive adhesive used for a thermosensitive positive CTP plate and a preparation method thereof. Background technique [0002] At present, the development speed of CTP technology in the world is very fast, and various CTP systems have competed on the stage. Among them, thermal CTP has the fastest development speed, and more than 60% of the total installed capacity of CTP is thermal plate-making machines, and thermal technology has become CTP. One of the mainstream directions of technology development and promotion, heat-sensitive CTP plates have the following advantages: (1) heat-sensitive CTP plates have low sensitivity to natural light and use infrared laser exposure, so they can be operated under bright room conditions; (2) heat-sensitive CTP plates Sensitive plates must reach the initial thermal energy threshold to generate images, and thermal energy higher than th...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/004C08G18/76C08G18/48C08G18/28
CPCG03F7/004C08G18/4829C08G18/7671C08G18/284
Inventor 孙长义郭俊成李长华
Owner 安徽强邦新材料股份有限公司
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