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Preparation method of hollow nano bowl-shaped structure, nano material and application

A nanomaterial and nano bowl technology, applied in nanotechnology, nanotechnology, chemical instruments and methods, etc., can solve the problems of complex preparation method of catalytic structure, slow preparation process and high preparation cost, and achieve enhanced catalysis, low preparation cost, The effect of enhancing catalytic performance

Active Publication Date: 2021-10-19
HANGZHOU DIANZI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Its disadvantages are that the preparation method of the catalytic structure is complex and the preparation cost is high, and the preparation process is slow

Method used

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  • Preparation method of hollow nano bowl-shaped structure, nano material and application
  • Preparation method of hollow nano bowl-shaped structure, nano material and application
  • Preparation method of hollow nano bowl-shaped structure, nano material and application

Examples

Experimental program
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Effect test

Embodiment 1

[0043] Such as figure 1 , figure 2 and image 3 As shown, the present embodiment provides a method for preparing a hollow nano-bowl structure, and the method for preparing comprises the following steps:

[0044] (A) Using the self-assembly method, a densely packed array of PS colloidal spheres with a diameter of 500 nm is self-assembled on a Si substrate with a hydrophilic surface to obtain an ordered nano-patterned structural template;

[0045] (B) Magnetron sputtering some copper particles on the surface of the ordered nano-patterned structure template obtained in step (A), and the sputtering time is 10s;

[0046] (C) plasma source etching of PS balls in the ordered nano-patterned structural template coated with copper particles obtained in step (B) for 20min;

[0047] (D) to the structure magnetron sputtering after the etching that obtains in the step (C), the copper film of long 300nm;

[0048] (E) Paste and fix the structure obtained in step (D), and paste and fix th...

Embodiment 2

[0052] Such as figure 1 , figure 2 and image 3 As shown, the present embodiment provides a method for preparing a hollow nano-bowl structure, and the method for preparing comprises the following steps:

[0053] (A1) Using the self-assembly method, a densely packed array of PS colloidal spheres with a diameter of 200 nm is self-assembled on a Si substrate with a hydrophilic surface to obtain an ordered nano-patterned structural template;

[0054] (B1) Magnetron sputtering some copper particles on the surface of the ordered nano-patterned structure template obtained in step (A1), the sputtering time is 5s under the conditions of argon flux of 25mL / min and air pressure of 0.6Pa ;

[0055] (C1) Etching the PS ball plasma source in the ordered nano-patterned structural template coated with copper particles obtained in step (B1) for 10 min;

[0056] (D1) Magnetron sputtering of the etched structure obtained in the step (C1), a copper film with a length of 150 nm;

[0057] (E1...

Embodiment 3

[0061] Such as figure 1 , Figure 4 and Figure 5 As shown, the present embodiment provides a method for preparing a hollow nano-bowl structure, and the method for preparing comprises the following steps:

[0062] (A2) Using the self-assembly method, a densely packed array of PS colloidal spheres with a diameter of 750 nm is self-assembled on a Si substrate with a hydrophilic surface to obtain an ordered nano-patterned structural template;

[0063] (B2) Magnetron sputtering some copper particles on the surface of the ordered nano-patterned structure template obtained in step (A2), the sputtering time is 15s under the condition of argon flux of 25mL / min and air pressure of 0.6Pa ;

[0064] (C2) After 30min plasma source etching of the PS pellets in the ordered nano-patterned structure template coated with copper particles obtained in step (B2), the following is obtained: figure 1 The structure shown in C;

[0065] (D2) to the structure magnetron sputtering after the etchin...

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Abstract

The invention provides a preparation method of a hollow nano bowl-shaped structure, a nano material and application. Firstly, a hollow copper nano bowl-shaped structure is obtained through magnetron sputtering and plasma etching, light is irradiated on the hollow copper nano bowl, the chemical interaction between adsorption molecules and the metal surface can be enhanced, comprising chemical bond enhancement, surface hybridization resonance enhancement, phonon-induced charge transfer enhancement and the like. The composite nano structure grows on a silicon wafer, local surface plasmon polaritons on the composite structure are excited through light irradiated on the composite structure, and transfer of charges in the nano structure is accelerated through hot electrons, hot holes and chemical energy excited by metal local surface plasmon polaritons, so that the catalytic efficiency is improved, and the catalysis of CO2 is enhanced through the surface plasmon polariton effect of gold and copper. The preparation cost is low, the preparation process is simple, and the method can be effectively copied and applied on a large scale.

Description

technical field [0001] The invention belongs to the technical field of synthesis of nanocomposite materials, and specifically relates to a preparation method, a nanomaterial and an application of a periodic hollow nanobowl-shaped structure with a relatively simple preparation method, a relatively fast preparation process and good performance. Background technique [0002] Surface plasmon induced growth technology has been widely used in the preparation of nanostructures. Due to its unique physical properties, surface plasmons make certain metals such as gold, silver, and copper have excellent properties in the excited state. , has important applications in biocatalysis, biomonitoring, crystal growth and other fields. [0003] The regulation of surface plasmons by researchers mainly focuses on the regulation and application of localized surface plasmons of surface plasmons, because the distribution area of ​​localized surface plasmons is very concentrated and the energy is hi...

Claims

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Application Information

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IPC IPC(8): C23C14/35C23C14/20C23C14/58B22F1/02B22F1/00B01J23/52B01J23/72B01J35/02B01J37/34B82Y30/00B82Y40/00
CPCC23C14/35C23C14/205C23C14/5873B01J23/72B01J23/52B01J37/342B01J37/349B82Y30/00B82Y40/00B01J35/393B01J35/40Y02A50/20
Inventor 赵晓宇温嘉红毛德源张永军王雅新
Owner HANGZHOU DIANZI UNIV
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