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Two-step texturing additive for preparing multilayer pyramid monocrystalline silicon textured surface and application thereof

An additive, silicon textured technology, applied in the directions of single crystal growth, single crystal growth, polycrystalline material growth, etc., can solve the problems of low photoelectric conversion efficiency of solar cells and high solar reflectance value, and achieve improved light trapping, Facilitates absorption and increases absorption

Pending Publication Date: 2021-10-22
西安蓝桥新能源科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Most of the textures obtained by the current monocrystalline silicon wafer texturing process have a pyramid structure, but the existing monocrystalline silicon textured texture has a high solar reflectance value, and the photoelectric conversion efficiency of solar cells is low.

Method used

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  • Two-step texturing additive for preparing multilayer pyramid monocrystalline silicon textured surface and application thereof
  • Two-step texturing additive for preparing multilayer pyramid monocrystalline silicon textured surface and application thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0024] A two-step texturing additive for preparing a multi-layer pyramid monocrystalline silicon textured surface, comprising additive A and additive B, said additive A comprising the following components calculated by mass percentage: Tween 2%, sodium benzoate 1%, silicon sodium phosphate 2.3% and the rest of the water; the additive B includes the following components calculated by mass percentage: peptone 5%, glucose 3.6%, lauryl polyoxyethylene ether 4.5%, sodium benzoate 2.1%, pyridine 3% and the remainder of the water.

[0025] A two-step texturing process for monocrystalline silicon, comprising the following steps:

[0026] S1. Mix a sodium hydroxide solution with a concentration of 10wt% and additive A to form a first reaction solution, place the cleaned monocrystalline silicon wafer in the first reaction solution for the first step of texturing, and the additive The addition amount of A in the first step of texturing process is 2wt%, the reaction time is 480s, and the...

Embodiment 2

[0030] A two-step texturing additive for preparing a multilayer pyramid monocrystalline silicon textured surface, comprising additive A and additive B, said additive A comprising the following components calculated by mass percentage: Tween 0.025%, sodium benzoate 0.1%, silicon sodium phosphate 8.0% and the remainder of water; the additive B includes the following components calculated by mass percentage: peptone 0.01%, glucose 10.0%, lauryl polyoxyethylene ether 0.01%, sodium benzoate 10%, pyridine 0.01% and the remainder of the water.

[0031] A two-step texturing process for monocrystalline silicon, comprising the following steps:

[0032] S1. Mix potassium hydroxide solution with a concentration of 10wt% and additive A to form a first reaction solution, place the cleaned monocrystalline silicon wafer in the first reaction solution for the first step of texturing, the additive The addition amount of A in the first step of texturing process is 10wt%, the reaction time is 10...

Embodiment 3

[0036] A two-step texturing additive for preparing a multi-layer pyramid monocrystalline silicon textured surface, comprising additive A and additive B, said additive A comprising the following components calculated by mass percentage: Tween 5%, sodium benzoate 4.0%, silicon sodium benzoate 0.12% and the rest of the water; the additive B includes the following components calculated by mass percentage: peptone 0.01%, glucose 10.0%, lauryl polyoxyethylene ether 0.01%, sodium benzoate 0.01%, pyridine 10% and the remainder of the water.

[0037] A two-step texturing process for monocrystalline silicon, comprising the following steps:

[0038] S1. Mixing tetramethylammonium hydroxide solution with a concentration of 10wt% and additive A to form a first reaction solution, placing the cleaned monocrystalline silicon wafer in the first reaction solution for the first step of texturing, The addition amount of the additive A in the first step of the texturing process is 0.1t%, the reac...

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Abstract

The invention belongs to the technical field of solar cell monocrystalline silicon wafer surface treatment. A two-step texturing additive for preparing a multilayer pyramid monocrystalline silicon textured surface comprises an additive A and an additive B. The additive A comprises the following components in percentage by mass: 0.02-5% of Tween, 0.1-4.0% of sodium benzoate, 0.12-8.0% of sodium silicate and the balance of water. The additive B is prepared from the following components in percentage by mass: 0.01 to 10 percent of peptone, 0.01 to 10.0 percent of glucose, 0.01 to 10 percent of polyoxyethylene lauryl ether, 0.01 to 10 percent of sodium benzoate, 0.01 to 10 percent of pyridine and the balance of water. The two-step texturing additive disclosed by the invention is applied to a monocrystalline silicon two-step texturing process, a monocrystalline silicon texturing surface with a multi-layer pyramid structure, which is more favorable for absorbing sunlight, can be formed, and the textured surface has a lower sunlight reflectivity value.

Description

technical field [0001] The invention belongs to the technical field of surface treatment of solar cell monocrystalline silicon wafers, and in particular relates to a two-step texturing additive for preparing a multilayer pyramid monocrystalline silicon textured surface and its application. Background technique [0002] At present, photovoltaic power generation has gradually become the key development direction of my country's electric power production industry. The parity of the Internet has promoted the technological innovation of solar cells. The first key link in the production and manufacturing process of monocrystalline silicon solar cells is to make undulating suede on the surface of silicon wafers. That is, monocrystalline silicon texturing, using the principle of light trapping, increases the absorption of sunlight by silicon wafers, thereby increasing the short-circuit current, increasing the specific surface area, and ultimately improving the photoelectric conversion...

Claims

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Application Information

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IPC IPC(8): C30B33/10C30B29/06H01L31/0236H01L31/18
CPCC30B33/10C30B29/06H01L31/1804H01L31/02363Y02E10/547Y02P70/50
Inventor 李侠张鹏伟张新鹏殷政冯萍萍
Owner 西安蓝桥新能源科技有限公司