Solar cell and preparation method thereof

Abstract

The invention discloses a solar cell, which comprises a silicon substrate, a tunneling layer, a first doped polycrystalline silicon layer, a first dielectric layer and a first electrode, a tunneling layer, a first doped polycrystalline silicon layer and a first dielectric layer are sequentially stacked on the surface of one side of the silicon substrate; the first electrode comprises a first main gate electrode and a first fine gate electrode, and the first fine gate electrode and the first main gate electrode intersect and are electrically connected; the first main gate electrode burns through the first dielectric layer and extends into the first doped polycrystalline silicon layer; crystalline first metal nanoparticles are arranged at the junction of the first doped polycrystalline silicon layer and the first main gate electrode; a plurality of first openings penetrating through the first dielectric layer are formed in the first dielectric layer; the first fine gate electrode is electroplated on the first doped polycrystalline silicon layer exposed out of the first opening. The invention also provides a preparation method of the solar cell. According to the solar cell, the usage amount of the first main gate electrode slurry is reduced, and the bonding strength of the first main gate electrode and the first fine gate electrode is enhanced.

Description

technical field [0001] The present application relates to the technical field of solar cells, in particular to a solar cell and a preparation method thereof. Background technique [0002] Crystalline silicon solar cells are currently the solar cells with the highest market share due to their high energy conversion efficiency. How to improve the conversion efficiency of crystalline silicon solar cells and components while reducing their production costs is the biggest problem facing the industry. At present, in large-scale silicon solar cell manufacturing, screen printing is usually used to realize the metallization process of silicon solar cells, but the accuracy of screen printing is limited, the shape of the printed electrode is fluctuating, and the electrodes are widened after printing and sintering. As a result, the formed grid has a low aspect ratio, thereby reducing the effective light-receiving area of ​​the light-receiving surface of the silicon solar cell, and in a...

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Problems solved by technology

The seed layer formation process is performed independently in separate devices, such as by sputtering or light-induced plating, but the sputtering of the seed layer requires additional sputtering equipment in the existing production line, and the sputtering of the desired pattern Mask steps are also used, the operation is complicated, it is difficult to reduce production costs, and the sputtering seed layer is usually not conductive enough to carry the large current density generated by silicon-based solar cells, and needs to be coated with other metals such as nickel and copper to enhance Conductivity

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