Nanometer colloid particle, preparation method, cleaning agent containing nanometer colloid particle and cleaning method

A technology of nano-colloid and cleaning agent, which is applied to cleaning methods and utensils, cleaning methods using liquids, detergent compositions, etc., can solve problems such as difficulty in meeting cleaning and process requirements, cumbersome cleaning method steps, and complex components, etc. Achieve the effect of eliminating the use of harmful chemicals, excellent surface cleaning effect with ultra-high cleanliness, and reducing the use of processes

Active Publication Date: 2022-04-08
ZHEJIANG AUFIRST MATERIAL TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0013] As mentioned above, a variety of sapphire cleaning solutions and cleaning methods are disclosed in the prior art, but there are still some defects in these cleaning solutions and / or cleaning methods, such as the components are too complicated, which brings problems to the subsequent waste liquid treatment, etc. Huge costs, and the cleaning method steps are cumbersome and the process is long
[0014] Therefore, the current sapphire cleaning solution and cleaning method in the prior art have various defects, and it is difficult to meet the increasingly demanding cleaning and process requirements.

Method used

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  • Nanometer colloid particle, preparation method, cleaning agent containing nanometer colloid particle and cleaning method
  • Nanometer colloid particle, preparation method, cleaning agent containing nanometer colloid particle and cleaning method
  • Nanometer colloid particle, preparation method, cleaning agent containing nanometer colloid particle and cleaning method

Examples

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Comparison scheme
Effect test

preparation example 1

[0114] Nano colloid particle preparation example 1: Preparation of nano colloid particle

[0115] A, in parts by mass, take by weighing 10 parts of nano silicon dioxide (particle size is 20-60nm), 0.5 part of colloidal stabilizer hydroxyethyl cellulose, 2.25 parts of silicon dioxide adsorbent polyacrylic acid (molecular weight is 5000-12000 ) and 80 parts of ultrapure water, and the ultrapure water is divided into two equal parts (that is, each part is 40 parts by mass) for use;

[0116] B. Add the nano silicon dioxide to the first part of ultrapure water under stirring, then add the silicon dioxide adsorbent under stirring at 100rpm, continue stirring for 45 minutes to obtain agent 1, which is ready for use;

[0117] C. Add the colloidal stabilizer into the second part of ultrapure water under stirring, and keep stirring at 100 rpm until the colloidal stabilizer is fully swollen to obtain agent II for use;

[0118] D. At a temperature of 25°C, while stirring the I agent at 1...

preparation example 2

[0119] Nano colloid particle preparation example 2: Preparation of nano colloid particle

[0120] A, in parts by mass, weigh 5 parts of nano silicon dioxide (particle size is 20-60nm), 1 part of colloidal stabilizer cellulose, 0.5 part of silicon dioxide adsorbent polymaleic acid (molecular weight is 15000-20000) And 90 parts of ultrapure water, and described ultrapure water is divided into two equal parts (that is, every part is 45 mass parts) stand-by;

[0121] B. Add the nano silicon dioxide to the first part of ultrapure water under stirring, then add the silicon dioxide adsorbent under stirring at 100rpm, continue stirring for 30 minutes to obtain agent I, and set aside;

[0122] C. Add the colloidal stabilizer into the second part of ultrapure water under stirring, and keep stirring at 100 rpm until the colloidal stabilizer is fully swollen to obtain agent II for use;

[0123] D. At a temperature of 25°C, while stirring the I agent at 100 rpm, slowly add the II agent, a...

preparation example 3

[0124] Nano colloid particle preparation example 3: Preparation of nano colloid particle

[0125] A, in parts by mass, take by weighing 15 parts of nano silicon dioxide (particle size is 20-60nm), 0.1 part of colloid stabilizer hydroxypropyl cellulose, 4 parts of silicon dioxide adsorbent acrylic acid-maleic acid copolymer ( Molecular weight is 3000-8000) and 70 parts of ultrapure water, and described ultrapure water is divided into two equal parts (being every part is 35 mass parts) stand-by;

[0126] B. Add the nano silicon dioxide to the first part of ultrapure water under stirring, then add the silicon dioxide adsorbent under stirring at 100rpm, continue stirring for 60 minutes to obtain agent I, and set aside;

[0127] C. Add the colloidal stabilizer into the second part of ultrapure water under stirring, and keep stirring at 100 rpm until the colloidal stabilizer is fully swollen to obtain agent II for use;

[0128] D. At 25°C, while stirring the I agent at 100rpm, slow...

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Abstract

The invention provides a nanometer colloid particle, a preparation method and application thereof, a cleaning agent containing the nanometer colloid particle, a preparation method of the cleaning agent, a cleaning method of the cleaning agent and the like, and the nanometer colloid particle comprises nanometer silicon dioxide, a colloid stabilizer and a silicon dioxide adsorbent. The cleaning agent comprises the nano colloid particles, a pH regulator, a surfactant, a wetting agent and ultrapure water. The nano colloid particle has excellent stability and cleaning effect, is especially suitable for cleaning hard and brittle material surfaces such as silicon wafers, sapphire substrates, optical glass, gallium arsenide substrates, precision ceramics and the like, and has wide application prospects and substitution potential.

Description

technical field [0001] The present invention relates to a supramolecular system formed by an inorganic compound and an organic compound and its preparation method and application, more particularly to a nano-colloid particle formed by nano-silicon dioxide and a hydrophilic polymer compound and its preparation method. It also relates to the use of the nano colloidal particles for surface cleaning of various hard and brittle materials, and further relates to a cleaning agent containing the nano colloidal particles and a cleaning method using the cleaning agent, belonging to the field of new cleaning agents and the technical field of surface treatment of hard and brittle materials . Background technique [0002] Hard and brittle materials such as sapphire is a crystalline material with good thermal conductivity and light transmission. It has excellent dielectric properties, high wear resistance, and good stability at high temperatures. It can be used as GaN-based materials and ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C11D1/75C11D1/83C11D3/10C11D3/12C11D3/20C11D3/22C11D3/37C11D3/60C11D7/12C11D7/20C11D7/26C11D7/60B08B3/08B08B3/12B08B11/00
CPCB08B3/04B08B3/08B08B3/12B08B11/00B82Y30/00B82Y40/00C11D1/75C11D3/00C11D1/83C11D3/10C11D3/12C11D3/20C11D3/22C11D3/37C11D7/12C11D7/20C11D7/26C11D7/00
Inventor 侯军吕晶
Owner ZHEJIANG AUFIRST MATERIAL TECH CO LTD
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