Preparation method and application of silicon resin
A technology of resin and silicate, which is applied in the direction of adhesives, etc., can solve problems such as the decline of aging resistance, the development of silicone pressure-sensitive adhesive technology and the influence of research on the performance of pressure-sensitive adhesives, and the impact on the catalyst activity of pressure-sensitive adhesives. Content, the effect of improving aging resistance
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Embodiment 1
[0047] Add 304.6g of methyl orthosilicate, 210g of hexamethyldisiloxane and 160g of xylene into reactor A, and gradually add the mixed solution of 28.8g of deionized water and 1.8g of concentrated hydrochloric acid into the system after stirring , Control the reaction temperature at 35°C during the dropwise addition. After the dropwise addition was completed, the temperature was raised to 80°C for reflux reaction for 3 hours, and then the temperature was gradually raised to 100°C to distill out methanol and water. After the product was washed with deionized water to neutrality, the residual water and methanol in the system were removed by vacuum distillation to obtain Xylene solution of MQ resin.
[0048] Add 300g of methyltrimethoxysilane, 500g of tetramethyldisiloxane, and 1.2g of trifluoromethanesulfonic acid into reactor B, stir evenly, add 105g of deionized water dropwise, and heat up to 70°C to reflux after the dropwise addition After reacting for 4h, the hydrogen-conta...
Embodiment 2
[0051] In reactor A, add 350.6g tetraethyl orthosilicate oligomer (Si40), 230g hexamethyldisiloxane and 100g xylene, start stirring and mix 32.3g deionized water and 3.2g concentrated hydrochloric acid Gradually add it dropwise to the system, and control the reaction temperature at 40°C during the process. After the dropwise addition was completed, the temperature was raised to 80°C for reflux reaction for 3 hours, and then the temperature was gradually raised to 100°C to distill out ethanol and water, and after the product was washed with deionized water to neutrality, the residual water and ethanol in the system were removed by distillation under reduced pressure to obtain Resin solution in xylene.
[0052] Add 300 g of methyltriethoxysilane, 600 g of 1,1,3,3,5,5-hexamethyl 1,5-dihydro-trisiloxane, and 2.4 g of trifluoromethanesulfonic acid into reactor B , stirred evenly, added dropwise 135g of deionized water, after the dropwise addition was completed, the temperature was...
Embodiment 3
[0055]Add 416.6g of ethyl orthosilicate, 210g of hexamethyldisiloxane and 130g of xylene into reactor A, and gradually add a mixed solution of 30g of deionized water and 2.5g of concentrated hydrochloric acid dropwise into the system after stirring is started. During the process, the reaction temperature was controlled at 30°C. After the dropwise addition was completed, the temperature was raised to 80°C for reflux reaction for 3 hours, and then the temperature was gradually raised to 100°C to distill out ethanol and water. After the product was washed with deionized water until neutral, the remaining water and ethanol in the system were removed by distillation under reduced pressure to obtain Resin solution in xylene.
[0056] Add 300g of methyltrimethoxysilane, 550g of tetramethyldisiloxane, and 1.8g of trifluoromethanesulfonic acid into reactor B, stir evenly, add 120g of deionized water dropwise, heat up to 75°C and reflux after the dropwise addition After reacting for 5h...
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