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Plasma enhanced cleaning device and cleaning method

A plasma and cleaning device technology, applied in the field of plasma cleaning, can solve the problems of ion flow divergence, limit, uneven etching, etc., and achieve the effect of improving cleaning ability

Pending Publication Date: 2022-05-06
GUANGDONG DTECH TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The above-mentioned ion sources have their own advantages and disadvantages: the anode layer ion source is a large-area ion source, which is especially suitable for plating large workpieces, and its ion current is also relatively large, but its ion flow is relatively divergent, and the energy level distribution is too wide; consider The ions generated by the Ffman ion source have strong directionality and concentrated ion energy bandwidth, which can be widely used in vacuum coating. The disadvantage is that the cathode is consumed and the ion flow is limited; The ion source ion beam requires supplemental electrons to neutralize the ion stream
[0004] For the field of vacuum coating, the positive energy of ion bombardment generated by conventional ion sources is sufficient, but for special-shaped fixtures, deep sipe tools or other products, uneven etching will occur, and the dirt in the deep groove Dirt cannot be cleaned and the performance of the final product will be affected

Method used

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  • Plasma enhanced cleaning device and cleaning method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0061] The cleaning method using the plasma enhanced cleaning device comprises the steps of:

[0062] (1) The product to be processed is selected from a long-deep sipe tool product, and the long-deep sipe tool product is ultrasonically cleaned and dried;

[0063] (2) Put the product to be processed into the jig and put it into the vacuum chamber, the turntable system drives the product to be processed to rotate synchronously, keep the rotation at a constant speed, the rotation speed is 1.2rpm, pump the vacuum at room temperature, and the vacuum is below 0.02Pa;

[0064] (3) feed the Ar gas of 300sccm, control the exhaust volume of the exhaust port, adjust the gas pressure to be 10.0Pa, apply a pulse bias voltage of 800V to the turntable system and the anode, and the duty ratio is 80%, so that the plasma generator starts, And in the cavity of the body part, an umbrella-shaped arc-shaped glow plasma with fixed frequency flickering is generated, and a slight glow corona appears o...

Embodiment 2

[0071] The cleaning method using the plasma enhanced cleaning device comprises the steps of:

[0072] (1) Select special-shaped jigs for the products to be processed, and perform ultrasonic cleaning and drying on the products with special-shaped jigs;

[0073] (2) Put the product to be processed into the jig and put it into the vacuum chamber, the turntable system drives the product to be processed to rotate synchronously, keep the rotation at a constant speed, the speed is 1rpm, pump the vacuum at room temperature, and the vacuum is below 0.02Pa;

[0074] (3) feed the Ar gas of 500sccm, control the exhaust volume of the exhaust port, adjust the gas pressure to be 28.0Pa, apply a pulse bias voltage of 800V to the turntable system and the anode, and the duty ratio is 70%, so that the plasma generator starts, And in the cavity of the body part, an umbrella-shaped arc-shaped glow plasma with fixed frequency flickering is generated, and a slight glow corona appears on the surface ...

Embodiment 3

[0081] The cleaning method using the plasma enhanced cleaning device comprises the steps of:

[0082] (1) The product to be processed is selected as a porous product, and the porous product is ultrasonically cleaned and dried;

[0083] (2) Put the product to be processed into the jig and put it into the vacuum chamber, the turntable system drives the product to be processed to rotate synchronously, keep the rotation at a constant speed, the speed is 2rpm, pump the vacuum at room temperature, and the vacuum is below 0.008Pa;

[0084] (3) feed the Ar gas of 180sccm, control the exhaust volume of the pumping port, adjust the gas pressure to be 0.2Pa, apply a pulse bias voltage of 600V to the turntable system and the anode, and the duty ratio is 60%, so that the plasma generator starts, And in the cavity of the body part, an umbrella-shaped arc-shaped glow plasma with fixed frequency flickering is generated, and a slight glow corona appears on the surface of the fixture for 10 min...

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Abstract

The invention discloses a plasma enhanced cleaning device which is used for cleaning a to-be-treated product and comprises a vacuum chamber, a plasma generator, a mounting part and a pulsed bias power supply, the vacuum chamber is provided with an air inlet and an air outlet, the plasma generator comprises a body part with a cavity, and the body part is provided with an upper part and a lower part; the upper part and the lower part are oppositely arranged and are both provided with a plurality of hollow parts; the mounting part extends into the vacuum chamber for mounting a plasma generator; the anode of the pulsed bias power supply is electrically connected with the vacuum chamber to form an anode, and the cathode of the pulsed bias power supply is electrically connected with the plasma generator. According to the plasma enhanced cleaning device, umbrella-shaped glow plasmas can be formed, up-down bombardment is enhanced, the cleaning capacity for products such as special-shaped jigs, large drills, PCB special cutters and deep cutter groove cutters is improved, transverse and longitudinal deep glow cleaning can be carried out, and the cleaning and activating effects of all faces of the products are integrally improved. The invention further provides a cleaning method.

Description

technical field [0001] The present invention relates to the technical field of plasma cleaning, and more specifically relates to a plasma enhanced cleaning device and a cleaning method. Background technique [0002] Ion source is a subject technology with a wide range of applications. In many basic research fields such as atomic physics, plasma chemistry, nuclear physics, etc., ion source is an indispensable device. During the working process of the ion source, under the interaction of the electromagnetic field, the gas discharge, particle collision and surface ionization are generated, and a large number of ions are generated and extracted into beams for product cleaning or enhanced reaction. [0003] In the field of vacuum coating, the ion source can greatly improve the bonding strength between the film and the substrate, and at the same time the hardness and wear resistance and corrosion resistance of the film itself will also be improved. The three common ion sources fo...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/02
CPCC23C14/022
Inventor 曹时义王俊锋袁明
Owner GUANGDONG DTECH TECH CO LTD
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