Conductive film and temperature sensor film
A technology of temperature sensor and conductive film, used in thermometers, thermometers using electrical/magnetic components directly sensitive to heat, conductive layers on insulating carriers, etc. High performance, durability and reliability
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Embodiment 1
[0095] In the roll-to-roll sputtering device, the roll of the above-mentioned hard-coated film substrate is set, and the sputtering device is exhausted until the vacuum reaches 5 × 10 -3 After Pa, a chromium oxide layer with a thickness of 7 nm and a nickel layer with a thickness of 250 nm were sequentially formed on the hard-coat layer formation surface at a substrate temperature of 80° C. by DC sputtering. The formation of the chromium oxide layer uses a metal Cr target, and introduces oxygen as a reactive gas (O 2 / Ar=1 / 8), with a pressure of 0.3Pa and a power density of 1.4W / cm 2 conditions for film formation. The nickel layer uses a metal nickel target, introduces argon as the sputtering gas, and uses a pressure of 0.3Pa and a power density of 5.0W / cm 2 conditions for film formation.
Embodiment 2
[0097] On the surface of the hard coat layer of the film substrate with a hard coat layer, a chromium oxide layer with a thickness of 7 nm and a silicon oxide (SiO 2 ) layer and a nickel layer with a thickness of 160nm. SiO 2 Layers were formed using a B-doped Si target, and oxygen was introduced as a reactive gas (O 2 / Ar=1 / 8), with a pressure of 0.3Pa and a power density of 1.4W / cm 2 conditions for film formation. The film-forming conditions of the chromium oxide layer and the nickel layer are the same as in Example 1.
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