Silicon wafer, silicon wafer textured structure and preparation method of silicon wafer textured structure

Abstract

The invention provides a silicon wafer, a silicon wafer textured structure and a preparation method thereof, and the preparation method comprises the following steps: (1) carrying out the anisotropic alkali texturing of the silicon wafer in an alkali solution, and drying the silicon wafer to obtain a first silicon wafer; (2) nano metal particle slurry is subjected to silk-screen printing in the electrode arrangement area of the first silicon wafer obtained in the step (1), and a second silicon wafer is obtained after drying; and (3) sequentially carrying out acid etching treatment and acid pickling treatment on the second silicon wafer obtained in the step (2), and drying to complete the preparation of the silicon wafer textured structure. The nano metal particles are arranged in the electrode arrangement area through silk-screen printing, then the nanoscale hole suede is obtained through acid etching treatment, high-concentration doping is conveniently achieved in the electrode arrangement area, and low-concentration doping is conveniently achieved in the non-electrode arrangement area; moreover, a screen printing plate used for silk-screen printing is the same as a screen printing plate used for arranging an electrode grid line, so that an electrode accurately corresponds to a high-concentration doped region, and the filling factor of the battery is ensured.

Description

technical field [0001] The invention belongs to the technical field of new energy, and relates to a method for processing silicon wafers, in particular to a silicon wafer, a textured structure of the silicon wafer and a preparation method thereof. Background technique [0002] Solar energy is sought after worldwide because of its cleanness, environmental protection and inexhaustible supply, and is considered to be the first of the most important new energy sources in the 21st century. In the field of solar photovoltaics, crystalline silicon solar cells have high conversion efficiency and simple sources of raw materials, and are still the main force in the solar cell industry. [0003] In traditional silicon solar cells, the diffusion concentration needs to be adapted to the requirements of the printed electrodes. Usually, the diffusion requires a higher doping concentration. At a higher doping concentration, the carrier recombination rate on the surface of the silicon wafer ...

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Problems solved by technology

However, this process also cannot achieve high-concentration doping and low-concentration doping in partitions.

[0010] Moreover, when setting the electrodes in the high-concentration doped region, it is necessary to ensure the precise alignment of the electrode and the doped region, otherwise there will be defects such as inaccurate alignment between the electrode and the high-concentration doped region, and a low fill factor; and, as During the screen printing, the graphic screen of the screen printing will also be deformed, resulting in unavoidable misalignment defects

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