Solar radiation protection composition

A compound, polyphenolic compound technology, used in cosmetics, skin care preparations, cosmetic preparations, etc., to reduce skin cancer and facilitate separation
CN1346260AInactive Publication Date: 2002-04-24NOUVAB
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
NOUVAB
Publication Date
2002-04-24
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention relates to sunscreen compositions for humans including naturally occurring sunscreen agents from plants, algae, cyanobacteria, fungi and bacteria that protect against exposure to solar radiation. The active sunscreen agents are compounds that naturally occur in plants, algae, cyanobacteria, fungi and bacteria and derivatives of these compounds.
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Description

Technical field

[0001] The invention relates to a formula for protecting humans and articles from sunlight radiation damage. The invention also relates to active ingredients and their derivatives extracted from plants, algae and cyanobacteria, which can avoid damage caused by sunlight. Background technique

[0002] Different layers of the earth’s atmosphere can absorb most of the solar radiation reaching the earth, especially the ozone layer can absorb high-energy ultraviolet rays. Among the sunlight radiation related to biology that reaches the surface of the earth, only 2% of the radiation is ultraviolet B (UV-B), and its characteristic wavelength range is 280-315nm. The rest are mainly ultraviolet A (UV-A), whose characteristic wavelength range is 315-400nm; visible light (wavelength range is 400-700nm), and infrared (characteristic wavelength greater than 740nm). The destruction of the stratospheric ozone layer by humans (Madroinichetal, 1995. Ambio 24:143) has led to an incr...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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