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Inductance framework having sputtering film electrode and its production method

A production method and sputtering film technology, applied in the direction of inductors, sputtering coating, fixed inductors, etc., can solve the problems of environmental pollution, high energy consumption, and large energy consumption

Inactive Publication Date: 2010-05-12
ZHEJIANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Its production process is complicated, energy consumption is high, cost is high, and environmental pollution is serious. It is difficult to deal with pollutants in the production process, and there are elements harmful to human body left on the product. It is difficult for the product to meet the standard requirements of the international market, especially , the existing SMD inductance skeleton has the problems of limited production materials such as ferrite or ceramics, large consumption of raw materials, high energy consumption, loose combination of metal electrodes and skeleton, low corrosion resistance, and relatively low tensile strength.

Method used

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  • Inductance framework having sputtering film electrode and its production method
  • Inductance framework having sputtering film electrode and its production method
  • Inductance framework having sputtering film electrode and its production method

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Embodiment Construction

[0017] refer to figure 1 , figure 2 : the present invention has the inductance framework of sputtering film electrode, and it comprises framework 1 and metal electrode layer 2, and described framework 1 adopts high molecular polymer materials such as plastics or epoxy resin plate to make, on framework 1 end face Bonded with a metal electrode layer 2, the electrode layer 2 is made of at least one layer of sputtering film, the sputtering film is a layered conductor; the electrode layer 2 can be made of the underlying metal sputtering film 6, transition layer metal sputtering Sputtering thin film 5 and surface layer metal sputtering thin film 4 are bonded together; said electrode layer 2 is made up of at least two layered sputtering thin film electrode blocks arranged adjacently and mutually insulated. Electrode layer 2 of the present invention can be Using sputtering technology and a mask, the electrode layer 2 is plated on the end face of the skeleton 1 in the same vacuum cyc...

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Abstract

This invention relates to an inductance framework with sputtered film electrodes and its production method including a framework and metallic electrode layer characterizing that said framework is madeof macromolecule polymer materials, a metallic electrode layer is pasted on the end face of the framework composed of at least one layer of sputter film, which is a laminated conductor, the frameworkis prepared by the technology of vacuum environment preparation, cleaning of the framework end face and sputter and coating.

Description

technical field [0001] The invention belongs to the technical field of basic electrical components, and in particular relates to an inductance skeleton with a sputtering film electrode and a production method thereof. Background technique [0002] Existing chip inductors are composed of ferrite or ceramic skeletons, coils, etc., and the manufacturing process is as follows: plate a metal electrode layer on the end surface of the skeleton, wind it with an enameled coil, and then weld the enameled wire head to the electrode layer. The enameled wire head is burnt off the paint skin in a high-temperature tin bath above 425°C, and welded to the metal electrode. In the prior art, metal electrodes are made by coating silver-lead-palladium slurry on the surface of ferrite and other skeletons, sintering at high temperature, and then chemically electroplating nickel, copper, silver and other metal layers on the basis of this metal layer. into. Its production process is complicated, e...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01F17/00H01F41/00C23C14/14C23C14/04
Inventor 王德苗任高潮董树荣金浩顾为民邵净羽
Owner ZHEJIANG UNIV