Hybrid integrated silicon-based photosignal processing chip
A technology for optoelectronic signals and processing chips, used in optical fiber transmission, electrical components, optical waveguides and light guides, etc., can solve the problems of the final performance impact of the device, the reduction of indicators and yields, and the high process requirements, achieving low cost, high yield, Simple craftsmanship
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[0032] Such as figure 1 In the shown embodiment, the material selected by the present invention is silicon on insulator (SOI or Silicon OnIsolator), and waveguide 2 is formed on silicon wafer 1 by etching as the transmission carrier of light. The advantage of this choice is that it allows final The realization of optoelectronic integration. The Ridge waveguide 2 is formed by etching the upper layer of the insulator silicon wafer 1, and the width of the Ridge waveguide is determined by the wavelength of the light to be transmitted and the single-mode condition. Between the waveguide 2 formed by etching and the lower silicon wafer 1a is an insulating oxide layer 3. The function of the insulating oxide layer 3 is to isolate the loss of light from the light wave to the lower silicon wafer, thereby ensuring the transmission of light in the waveguide silicon layer. The bridge waveguides formed by etching define the direction of light in the planar chip.
[0033] Such as figure 2...
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