Electroporator having an elongated hollow member
An electroporation and hollow technology, which is applied in the direction of electric/wave energy treatment of enzymes, electricity/wave energy treatment of microorganisms, microorganisms, etc., can solve problems such as increased surface resistance, harmful cells, and larger sample volumes
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Embodiment 1
[0081] Preferred Example 1: Electroporation experiment of human embryonic kidney HEK-293 cell line (cell line) using a pipette-type electroporation device
[0082] 1-1 Cell preparation
[0083] HEK-293 cell line (ATCC, CRL-1573) in 25 square centimeters (cm 2 ) culture flasks stored in medium supplemented with 10% fetal bovine serum (fetal bovine serum, FBS), in CO 2 Culture in an incubator and grow to 70% confluency. Next, the above medium was removed, and the cells were washed with phosphate buffered solution (PBS) and treated with trypsin. A medium supplemented with FBS was added and centrifuged, and then the cells were washed with a PBS buffer solution and suspended again in a medium supplemented with 10% FBS to prepare a cell sample.
[0084] 1-2 Electroporation
[0085] About 100 microliters (μl) of HEK-293 cell samples prepared in 1-1 were loaded into the reservoir at room temperature. 5 micrograms (µg) of plasmid DNA pEGFP (source: GenBank Accession: U55762; CLONT...
Embodiment 2
[0103] Preferred embodiment 2: use the electroporation device of channel structure to carry out electroporation experiment on SK-OV-3
[0104] 2-1 Manufacture of microchannel structure
[0105] In preferred embodiment 2, a biological experiment is performed using an electroporation device having a sample filler with a microchannel structure. An electroporation device is manufactured by a method such as moulding, having wells into which electrodes are inserted and channels for connecting the wells to hollow sample packs. Sample packings were fabricated with different channel structures, the channels had a height of 20 μm, a length of 2 cm, and a width of 100 to 500 μm. However, obviously, the channel pattern is formed by photolithography using a photomask. For example, first, a negative photoresist (SU-8, MicroChem, Massachusetts, USA) is spin-coated on a silicon wafer to form a 20 μm thick mold master. A soft bake was performed by a mask aligner (MA-6, Karl Suss GmbH, Germa...
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