Bipolar Electrostatic Chuck

a bipolar electrostatic and chuck technology, applied in the direction of electrostatic holding devices, basic electric elements, electric devices, etc., can solve the problems of deterioration of dielectric breakdown strength between adjacent electrodes, discharge limit, voids, etc., and achieve excellent attracting performance, excellent flatness of held samples, and shorten the distance between the first electrode and the second electrode

Inactive Publication Date: 2007-09-27
CREATIVE TECH CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0060] The bipolar electrostatic chuck according to the present invention is structured to have the first electrode, the interelectrode insulating layer, and the second electrode in the order of distance from the sample attracting plane in the depth direction of the insulating material. With the above structure, the bipolar electrostatic chuck according to the present invention is excellent in electrical insulation, and is capable of shortening the distance between the first electrode and the second electrode as much as possible, thereby exercising the excellent attracting performance. As a result, the bipolar electrostatic chuck according to the present invention is excellent in the flatness of the held sample, and exercises the sufficient attracting performance with respect to a glass substrate that exceeds 1 m×1 m so as to accept the recent large size glass substrate, a silicon wafer that is equal to or more than 300 mm in diameter, or the like. Also, the bipolar electrostatic chuck according to the present invention is capable of exercising the excellent attracting performance. As a result, the bipolar electrostatic chuck according to the present invention is capable of conducting in the low voltage operation, is advantageous in the economical viewpoint, eliminates the discharge problem as much as p...

Problems solved by technology

However, in the case where the distance between the electrodes that are adjacent to each other is shortened, there arises a problem of a discharge limit.
Also, voids occur when an adhesive agent for forming an adhesive layer that fixes the respective insulating layers to each other or the insulating layers with the electrodes is bonded.
As a result, the dielectric breakdown strength is remarkably deteriorated between the adjacent electrodes.
For that reason, in the conventional bipolar electrostatic chuck that narrows the interval between the electrodes as described above, a voltage that can be actually applied is limited, and there arises such a problem that a sufficient attracting ...

Method used

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first embodiment

[0092]FIG. 1 shows an explanatory exploded perspective view of a bipolar electrostatic chuck X according to a first embodiment of the present invention. The bipolar electrostatic chuck X includes an upper insulating layer 1 that is formed of a polyimide film having a thermoplastic polyimide film on a lower surface thereof which is 100 mm in height×100 mm in width, 50 μm in thickness, and a dielectric constant ε=3.5, a first electrode 2 made of copper which is 3 μm in thickness, and an interelectrode insulating layer 3 that is formed of a polyimide film which is 100 mm in height×100 mm in width, 50 μm in thickness, and a dielectric constant ε=3.5. The bipolar electrostatic chuck X also includes a second electrode 4 made of copper that is 3 μm in thickness, a lower insulating layer 5 that is formed of a polyimide film having a thermoplastic polyimide film on an upper surface thereof which is 100 mm in height×100 mm in width, 50 μm in thickness, and a dielectric constant ε=3.5, and a m...

second embodiment

[0099]FIG. 4 shows an explanatory cross-sectional view of a bipolar electrostatic chuck X according to a second embodiment of the present invention. FIG. 5 shows an explanatory partial plan view of a first electrode 2 and a second electrode 14 of the bipolar electrostatic chuck X according to the second embodiment, viewed in a depth direction of the sample attracting plane 7.

[0100] In the bipolar electrostatic chuck X according to the second embodiment, an electrode width of the band-like portions 14a of the second electrode 14 is set to 0.6 mm, and the band-like portions 14a of the second electrode 14 are arranged in the center of gaps (1 mm) which are formed between the respective band-like portions 2a of the first electrode 2. Band-like comb teeth of the first electrode 2 and band-like comb teeth of the second electrode 14 are alternately arranged, and the first electrode 2 and the second electrode 14 are arranged when the sample attracting plane 7 is viewed in the depth directi...

third embodiment

[0101]FIG. 6 shows an explanatory exploded perspective view of a bipolar electrostatic chuck X according to a third embodiment of the present invention. FIG. 7 shows an explanatory cross-sectional view (a part of a cross-section A-A of FIG. 6) of the bipolar electrostatic chuck X according to the third embodiment. FIG. 8 shows an explanatory partial plan view of a first electrode 2 and a second electrode 24 of the bipolar electrostatic chuck X according to the third embodiment, viewed in a depth direction of the sample attracting plane 7. In FIG. 8, a dotted area portion represents a portion in which the second electrode 24 is overlapped with the first electrode 2 when the sample attracting plane 7 is viewed in the depth direction.

[0102] In the bipolar electrostatic chuck X according to the third embodiment, the conditions other than a condition in which the second electrode 24 is formed in a plane having a planar area that is 80 mm in height×80 mm in width are set to be identical ...

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PUM

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Abstract

A bipolar electrostatic chuck which has excellent dielectric breakdown strength and provides excellent attracting performance. The bipolar electrostatic chuck eliminates difficulty in dismounting a sample from a sample attracting plane as much as possible after application of a voltage to electrodes is finished. The bipolar electrostatic chuck is provided with a first electrode and a second electrode in an insulator and permits a surface of the insulator to be the sample attracting plane. The insulator has the first electrode, an interelectrode insulating layer and the second electrode in this order from the sample attracting plane in the depth direction. The second electrode has a region not overlapping with the first electrode in a normal line direction of the sample attracting plane.

Description

TECHNICAL FIELD [0001] The present invention relates to a bipolar electrostatic chuck that electrostatically attracts and holds a sample. BACKGROUND ART [0002] There has been widely employed an electrostatic chuck that electro-statically attracts and holds a sample such as a wafer or a glass in a device that is used in a semiconductor manufacturing process required in forming an integrated circuit on a semiconductor wafer such as silicon, such as an etching device, a plasma processing device used for formation of a thin film through a chemical vapor deposition (abbreviated to CVD), an electron exposure device, an ion rendering device, an ion implanting device, or in a device that is used in a process of manufacturing a liquid crystal display panel which is employed for a TV screen or a computer display such as a substrate bonding device or an ion doping device which is used in press-inserting liquid crystal in an insulating substrate such as a glass. This is because the electrostati...

Claims

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Application Information

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IPC IPC(8): H01L21/683H01L21/68H02N13/00
CPCH02N13/00H01L21/6833H01L21/68H01L21/687
Inventor FUJISAWA, HIROSHIMIYASHITA, KINYA
Owner CREATIVE TECH CORP
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