The invention relates to the technical field of production of electronic chemicals, and discloses an electronic grade
sulfuric acid deep
impurity removal production process based on dynamic cycle adsorption, which comprises the following steps: preparing an adsorbent, providing
mesoporous silica gel loaded with
dithizone-phosphonic acid difunctional groups as the adsorbent, the pore size of the
mesoporous silica gel being 10-50nm, and the specific surface area being greater than 500m / g; the method comprises the following steps: constructing a
system, namely establishing a double-adsorption-column dynamic circulating
system, dividing the interior of an adsorption column into a saturated region, a
mass transfer region and an unpolluted region, and controlling an electronic-grade
sulfuric acid solution to continuously flow at a constant flow speed at 30-45 DEG C through a
programmable logic controller (PLC); and adsorption operation. According to the invention, the
dithizone-phosphonic acid
bifunctional group accurately captures
metal cation impurities in electronic-grade
sulfuric acid through the strong coordination ability of
sulfur atoms and
transition metal ions, and a double-site synergistic adsorption mechanism is formed.