Method for preparing carbon nano-tube coextruded film on single-crystal silicon slice surface
A technology of carbon nanotube composite and single crystal silicon wafer, which is applied in the direction of surface coating liquid device, superimposed layer plating, metal material coating process, etc., can solve the problem that does not involve the improvement of carbon nanotube film performance And research, long heat treatment time, cumbersome self-assembled film process conditions and other issues, to achieve the effect of low cost, simple configuration, and good anti-wear performance
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Embodiment 1
[0019] Carbon nanotubes: multi-walled carbon nanotubes produced by Shenzhen Nanoport Co., Ltd.
[0020] Pretreat the monocrystalline silicon wafer, soak the monocrystalline silicon wafer in aqua regia, heat the aqua regia in an electric furnace for 5 hours, cool it naturally at room temperature, take out the monocrystalline silicon wafer, and repeat it with deionized water. Rinse, place in a desiccator to dry. After drying, soak in Pirahan solution (H 2 SO 4 :H 2 o 2 =70:30, V / V), treated at room temperature for 1 hour, ultrasonically cleaned with deionized water, placed in a dust-proof device and dried in an oven, and then immersed in the prepared mercaptosilane In the solution, let it stand for 6 hours, the molar concentration of the components of the mercaptosilane solution is: 3-mercaptopropylmethyldimethoxysilane 0.5mmol / L, the solvent is benzene solution; after taking it out, use chloroform, acetone, deionized After rinsing with water to remove organic substances ph...
Embodiment 2
[0026] Carbon nanotubes: single-walled carbon nanotubes, double-walled carbon nanotubes and multi-walled carbon nanotubes produced by Shenzhen Nano Harbor Co., Ltd.
[0027] Pretreat the monocrystalline silicon wafer, soak the monocrystalline silicon wafer in aqua regia, heat the aqua regia with an electric furnace for 6 hours, cool it naturally at room temperature, take out the monocrystalline silicon wafer, and repeat it with deionized water Rinse, place in a desiccator to dry. After drying, soak in Pirahan solution (H 2 SO 4 :H 2 o 2 =70:30, V / V), treated at room temperature for 1 hour, ultrasonically cleaned with deionized water, placed in a dust-proof device and dried in an oven, and then immersed in the prepared mercaptosilane In the solution, let it stand for 8 hours, the molar concentration of the components of the mercaptosilane solution is: 3-mercaptopropylmethyldimethoxysilane 0.1mmol / L, the solvent is benzene solution; after taking it out, use chloroform, aceto...
Embodiment 3
[0032] Carbon nanotubes: single-walled carbon nanotubes, double-walled carbon nanotubes and multi-walled carbon nanotubes produced by Shenzhen Nano Harbor Co., Ltd.
[0033] Pretreat the monocrystalline silicon wafer, soak the monocrystalline silicon wafer in aqua regia, heat the aqua regia in an electric furnace for 5 hours, cool it naturally at room temperature, take out the monocrystalline silicon wafer, and repeat it with deionized water. Rinse, place in a desiccator to dry. After drying, soak in Pirahan solution (H 2 SO 4 :H 2 o 2 =70:30, V / V), treated at room temperature for 1 hour, ultrasonically cleaned with deionized water, placed in a dust-proof device and dried in an oven, and then immersed in the prepared mercaptosilane In the solution, let it stand for 7 hours, the molar concentration of the components of the mercaptosilane solution is: 3-mercaptopropyltrimethoxysilane 1.0mmol / L, and the solvent is benzene solution; after taking it out, wash it with acetone, c...
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