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Epitaxial strontium barium niobate film possessing transparent conductive lithium nickel oxide bottom electrode and its preparation method

A barium strontium niobate, transparent and conductive technology, applied in nonlinear optics, instruments, optics, etc., can solve the problem of no epitaxial growth transfer, etc., and achieve the effects of good market prospects, improved crystalline properties of thin films, and simple preparation technology.

Inactive Publication Date: 2009-09-09
ZHEJIANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the epitaxial growth direction of the lanthanum nickelate material on the MgO substrate is the (110) direction, so it does not have the effect of (001) direction epitaxial growth transmission

Method used

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  • Epitaxial strontium barium niobate film possessing transparent conductive lithium nickel oxide bottom electrode and its preparation method
  • Epitaxial strontium barium niobate film possessing transparent conductive lithium nickel oxide bottom electrode and its preparation method
  • Epitaxial strontium barium niobate film possessing transparent conductive lithium nickel oxide bottom electrode and its preparation method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] Using lithium carbonate and nickel oxide as raw materials, mix 15% lithium carbonate and 85% nickel oxide according to the mass percentage, grind for 4 hours, press at a pressure of 5MPa, and sinter in air at a sintering temperature of 850 ℃, the heating rate is controlled at 300℃ / h, the holding time is controlled at 2h, and the lithium nickelate target is obtained after cooling down; using strontium carbonate, barium carbonate and niobium oxide as raw materials, strontium carbonate with a mass percentage of 25%, After mixing 30% barium carbonate and 45% niobium oxide, grind for 4 hours, press and shape at a pressure of 6 MPa, and sinter in air, the sintering temperature is 880 °C, the heating rate is controlled at 400 °C / h, and the holding time is controlled at 2.5 h, the strontium barium niobate target was obtained after cooling down; the prepared lithium nickelate target was used to deposit lithium nickelate film on the (001) MgO substrate by pulse laser deposition me...

Embodiment 2

[0030] Using lithium carbonate and nickel oxide as raw materials, mix 10% lithium carbonate and 90% nickel oxide according to the mass percentage, grind for 3 hours, press at a pressure of 2MPa, and sinter in air at a sintering temperature of 800 ℃, the heating rate is controlled at 100℃ / h, the holding time is controlled at 1h, and the lithium nickelate target is obtained after cooling down; using strontium carbonate, barium carbonate and niobium oxide as raw materials, strontium carbonate with a mass percentage of 30%, After mixing 10% barium carbonate and 60% niobium oxide, grind for 5 hours, press and shape at a pressure of 10MPa, and sinter in air, the sintering temperature is 900°C, the heating rate is controlled at 600°C / h, and the holding time is controlled at 3h , after cooling down, the barium strontium niobate target was obtained; the prepared lithium nickelate target was used to deposit lithium nickelate film on the (001) MgO substrate by pulse laser deposition metho...

Embodiment 3

[0032] Using lithium carbonate and nickel oxide as raw materials, mix 17% lithium carbonate and 83% nickel oxide according to the mass percentage, grind for 3 hours, press at a pressure of 5 MPa, and sinter in air at a sintering temperature of 850 ℃, the heating rate control range is 300℃ / h, the holding time is controlled at 1h, and the lithium nickelate target is obtained after cooling down; using strontium carbonate, barium carbonate and niobium oxide as raw materials, strontium carbonate with a mass percentage of 26% , 16% barium carbonate mixed with 58% niobium oxide, ground for 3 hours, press-molded with a pressure of 5MPa, and sintered in air, the sintering temperature was 850°C, the heating rate was controlled at 300°C / h, and the holding time was controlled at After 2 hours, the barium strontium niobate target was obtained after cooling down; using the prepared lithium nickelate target, the lithium nickelate film was deposited on the (001) MgO substrate by using the puls...

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Abstract

The invention discloses an epitaxial barium strontium niobate thin film with a transparent conductive lithium nickel oxide bottom electrode and a preparation method thereof. On one side of the MgO substrate, an LNO thin film, a transparent conductive layer of LNO lithium nickelate, is epitaxially deposited, and then an SBN thin film is epitaxially prepared on the LNO thin film. The preparation steps are as follows: first, using lithium carbonate, nickel oxide, niobium oxide, strontium carbonate, and barium carbonate as raw materials, the lithium nickelate target and the strontium barium niobate target are prepared respectively by solid-state sintering; secondly, the (001) MgO After the substrate is cleaned, put it into the reaction chamber. The reaction chamber is evacuated, and the substrate is heated. Oxygen is used as a protective gas to introduce into the reaction chamber. barium film. The preparation method of the invention is simple, and the obtained barium strontium niobate thin film grows epitaxially in the (001) direction, the thin film has good epitaxy, high quality, large electro-optical coefficient (r33 can reach 180-230pm / V), and has good application prospect.

Description

technical field [0001] The invention relates to a preparation technology of an optical waveguide film on a (001) MgO substrate, in particular to a PLD preparation of a transparent conductive epitaxial lithium nickelate bottom electrode layer, followed by an epitaxial high electro-optic coefficient barium strontium niobate film and a preparation method thereof. Background technique [0002] Optical waveguide material is an electro-optic material with broad application prospects. It is a material that can confine light waves in a medium with a size of the wavelength of light, and transmit long distances without radiation. Common optical waveguide devices include (1). Optical interconnectors (straight, S-curved) (2). Power splitters (1:2: Y-type and MMI type) (3). Optical waveguide reflectors (mirrors and Grating) (4). Bidirectional coupler (5). Polarizer (6). Polarizing beam splitter (anisotropic polarizing beam splitter) (7). Phase modulator (E-O phase modulator) (8). Intens...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02F1/035G02F1/03
Inventor 杜丕一李晓婷麦炽良黄健洪翁文剑韩高荣赵高凌沈鸽徐刚张溪文
Owner ZHEJIANG UNIV
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