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Electromagnetic wave screening film and its producing method

A manufacturing method and shielding film technology, applied in the direction of magnetic/electric field shielding, shielding, electrical components, etc., can solve the problems of complex preparation process, high surface resistance, low light transmittance, etc., and achieve simple preparation method and low surface resistance , good shielding effect

Active Publication Date: 2007-07-25
CHINA LUCKY FILM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The electromagnetic wave shielding film prepared by sputtering has limited its application range due to its low light transmittance and high surface resistance.
The etching method is to paste the copper foil on the transparent PET film, and form a copper grid with a fine line grid by photolithography. The preparation process is complicated and the cost is high.
The silver complex salt diffusion transfer method is on the transparent PET film, first coated with palladium, rhodium and other catalytic nuclei, then coated with silver halide emulsion, for physical development, and then plated copper or nickel metal film, this method is due to the residual catalytic nuclei Absorbs light, so the main problem is low light transmittance

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0038] 1. Preparation of Silver Halide Emulsion

[0039] The emulsion was prepared according to the production method of silver halide emulsion used in the field of photographic photosensitive materials. The composition of the silver halide emulsion is a silver bromoiodide emulsion with 98 mol% silver bromide and 2% mol% silver iodide. The average particle size of the emulsion is 0.09 microns, and the emulsion is doped with K 2 IrCl 6 and K 3 RhBr 6 . The emulsion was further sulfur-gold sensitized with potassium tetrachloroaurate and sodium thiosulfate. Then be coated on the PET film, coating silver amount is 4.0 grams / square meter, dry.

[0040] 2. Exposure and development

[0041] After the above-mentioned coated sample is dried, it is exposed with ultraviolet light. The grid template with line width / spacing=285 microns / 15 microns is used for exposure, developed with the following developer, then fixed with F-5 fixer, and deionized water After washing, a silver grid...

Embodiment 2

[0067] 1. Preparation of Silver Halide Emulsion

[0068] The emulsion was prepared according to the production method of silver halide emulsion used in the field of photographic photosensitive materials. The composition of the silver halide emulsion is a silver chlorobromide emulsion in which silver chloride is 70 mole percent and silver bromide is 30 mole percent. The average particle size of the emulsion is 0.23 microns, and the emulsion is doped with K 2 IrCl 6 and K 3 RhBr 6 . The emulsion was further sulfur-gold sensitized with potassium tetrachloroaurate and sodium thiosulfate. Then be coated on the PET film, coating silver amount is 3.0 grams / square meter, dry.

[0069] 2. Exposure and development

[0070] After the above-mentioned coated sample is dried, it is exposed with ultraviolet light. The grid template with line width / spacing=200 microns / 12 microns is used for exposure, developed with the following developer, then fixed with F-5 fixer, and deionized water...

Embodiment 3

[0095] 1. Preparation of Silver Halide Emulsion

[0096] With embodiment 2.

[0097] 2. Exposure and development

[0098] After the above-mentioned coating sample is dried, it is exposed with ultraviolet light. The grid template of line width / spacing=320 microns / 25 microns is used for exposure, developed with the developer in Example 1, then fixed with F-5 fixer, and deionized Rinse with water to obtain a silver grid image, the line width / space = 25 μm / 320 μm.

[0099] 3. Thickening treatment

[0100] With embodiment 2.

[0101] 4. Activation treatment

[0102] The above thickened sample was activated in 0.1% palladium chloride aqueous solution for 3 minutes. Then wash with water and perform electroless copper plating.

[0103] 5. Electroless copper plating

[0104] Electroless copper plating was performed on the above-mentioned treated samples in the following plating solution, the pH value of the plating solution was adjusted to 9.0 with sodium hydroxide, and copper p...

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Abstract

The method comprises: using the supporter and the thin line grid mesh formed on the supporter to compose a conducting film. The thin line grid mesh is composed of silver and copper coated on the silver; the quantity of the copper is 55%-90 % of total mass. The line width of grid mesh is 5-25ª–m; the opening ratio is 85%-95%; the surface resistance is more than 0ohm and less than 5ohm. The preparation method comprises: coating silver salt layer and its protective layer, and applies grid mesh exposure and developing process; the exposed part respectively forms metal silver part; the un-exposure part forms the transparent part; the metal silver part is thickened and made with activation treatment; coating the metal to form conducting metal part.

Description

technical field [0001] The invention relates to a shielding film, in particular to an electromagnetic wave shielding film and a manufacturing method thereof. Background technique [0002] In recent years, with the rapid development of the information society, information-related equipment has developed rapidly and gradually become popular. Various electronic equipment and communication devices such as CRT, liquid crystal, EL, PDP, FED and other display devices are widely used in TV Guide displays for airports, personal computers, stations, and airports to provide a variety of information. The problem of electromagnetic wave interference (EMI) produced by these electronic devices, electronically controlled game machines such as pinball boards and slot machines, and communication devices such as mobile phones is also becoming more and more serious. [0003] Electromagnetic wave interference will not only affect the operation accuracy of surrounding electronic equipment and ca...

Claims

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Application Information

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IPC IPC(8): H05K9/00G12B17/02
CPCH05K9/0094H05K9/00
Inventor 张建臣王晓丽成志秀章峰勇邹竞
Owner CHINA LUCKY FILM CORP