Method for precipitating large area amorphous, nanocrystalline alloy layer using magnesium alloy surface glow plasma
A glow plasma and nanocrystalline alloy technology, applied in ion implantation plating, metal material coating process, coating, etc., can solve the problems of poor protection of passivation film, shedding of protective layer, corrosion of magnesium alloy, etc., and achieve super Good plasticity, improved corrosion resistance, and excellent corrosion resistance
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example 1
[0016] Pure aluminum is used as the target material, its melting point is around 650°C, and magnesium alloy AZ31 is used as the workpiece. The deposition process is as follows: the target material is 600V, the workpiece voltage is 300V, the air pressure is 30Pa, the distance between the target material and the workpiece is 35mm, and the deposition time is 3h. Figure 1 shows the β-Al formed on the surface of AZ31 magnesium alloy 2 Mg amorphous, subsurface β-Al 2 SEM pictures of Mg nanocrystals. Figure 2 is a transmission electron micrograph of the glow sputtering deposited layer. Observation by transmission electron microscope can prove that the surface of the deposited layer has an amorphous structure (diffraction pattern is a typical amorphous halo), while the subsurface layer is nanocrystalline, and its grain size is less than 5nm. The electrochemical performance test results of the sputtered deposition layer in 3.5% NaCl solution show that the natural corrosion potential ...
example 2
[0018] The HastelloyC-2000 alloy is used as the target material, its melting point is around 1300°C, the magnesium alloy AZ31 is used as the workpiece, the deposition process is as follows: the target material is 600V, the workpiece voltage is 300V, the air pressure is 30Pa, the distance between the target material and the workpiece is 35mm, and the deposition time is 3h . Figure 3 is the SEM photo of Ni-Cr-Mo-Cu amorphous and subsurface nanocrystals formed on the surface of AZ31 magnesium alloy (the deposition process is: target 600V, workpiece voltage 300V, air pressure 30Pa, distance between target and workpiece 35mm, deposition time 3h). Figure 4 is a transmission electron micrograph of the glow sputtering deposited layer. Observation by transmission electron microscope can prove that the surface of the deposited layer is amorphous (diffraction pattern is a typical amorphous halo), while the subsurface layer is nanocrystalline structure, and its grain size is less than 10...
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