Heat resistant film, its manufacturing method, and electrical and electronic parts
A technology of protective film and manufacturing method, which is applied in the direction of contact manufacturing, chemical instruments and methods, contact parts, etc., and can solve the problems that the layer thickness has not been studied, and the surface treatment method cannot meet the requirements, etc.
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Embodiment 1
[0056] Table 1. The composition and thickness of the 16 surface treatment materials prepared in advance from No.1 to No.16 are recorded. The formation method of each layer is an electroplating method. Specifically, a Ni sulfamic acid bath was used for the Ni layer, a copper sulfate bath was used for the Cu layer, and a sulfate bath was used as the electroplating solution for the Sn layer, and pickling was performed before and after the Ni electroplating process.
[0057] No. 9, No. 10, and No. 15 were not subjected to Ni electroplating, No. 11 was not subjected to Ni and Cu electroplating, No. 12 was not subjected to Cu electroplating, and No. 16 was not subjected to Sn electroplating (marked as - in Table 1).
[0058] The base material is a copper alloy plate containing 1% Ni, 0.9% Sn, and 0.05% P. It is a rolled material with a thickness of 0.25mm. μm, the surface oxide layer thickness of the base material is about 7nm, which is much smaller than the required 20nm thickness...
Embodiment 2
[0077] It has the same composition of each electroplating layer as in Example 1. However, the base material of No.17, 18, and 21 materials is brass with a plate thickness of 0.8 mm, and the base material of No. 19, 20, and 22 materials is phosphor bronze with a plate thickness of 0.2 mm. The above base material is brass material and the base material is phosphor bronze material. The surface roughness of the ten point average roughness is 1.0, 0.9μm respectively, and the average roughness of the center line is 0.13, 0.08μm respectively. The surface oxide layer of the base material Both are about 8nm thick, much thinner than the required 20nm.
[0078] The second is to carry out continuous remelting treatment at 350-800°C for 5-20 seconds. While performing remelting treatment, a Cu-Sn diffusion layer is formed, and the above materials are prepared according to the above method. The same method as in Example 1 was used to investigate and measure the coefficient of friction of th...
Embodiment 3
[0086] The same electroplating as in Example 1 was carried out on the same material as in Example 1 to form various electroplating layers. The plating layer on the outermost surface of materials No.23, 24, and 27 was changed to a Sn alloy layer. The lower electroplating layer of No.23 and No.27 materials was changed to Ni layer. The lower electroplating layer of No. 24 material was changed to Ni alloy layer. The outermost electroplating layer of No.25, 26, and 28 materials is a Sn layer, and the lower electroplating layer is changed to a Ni alloy layer.
[0087] The Sn alloy electroplating layer uses an organic complex salt solution for Sn-10% Zn electroplating. The Ni alloy plating layer was Ni-5%P plating using a watt bath added with phosphorous acid.
[0088] The same remelting conditions as in Example 1 were selected for remelting treatment. During the Sn-Zn alloy electroplating process, Zn will diffuse to the surface to form an oxide centered on Zn oxide, but it does n...
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