Method for preparing anode aluminum oxide thin film with thick barrier layer
A technology of anodized aluminum and anodic oxidation, which is applied in the field of materials, can solve problems such as breakdown, and achieve the effects of high breakdown voltage, wide application prospects, and high specific surface area
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Embodiment 1
[0020] This embodiment 1 is implemented under the following conditions of implementation and technical requirements:
[0021] In the first step, the aluminum foil that has not been annealed and electrochemically polished is placed in a 6% phosphoric acid solution with ethylene glycol as a solvent for the first anodic oxidation, the temperature is 5 ° C, and the current density is constant at 5 mA cm -2 , the oxidation time is 300s.
[0022] In the second step, the porous anodic aluminum oxide film obtained by the above oxidation is cleaned with deionized water, and the second step of anodic oxidation is carried out in a 5% ammonium sebacate solution with ethylene glycol as a solvent, and the temperature is 50 ℃, the current is constant at 5mA cm -2 , until the breakdown voltage (450V) is reached. In this process, under the action of electric field, Al 3+ Migrate to the electrolyte / oxide film interface, O 2- / OH - Migrating to the oxide film / metal interface, the aluminum o...
Embodiment 2
[0025] This embodiment 2 is implemented under the following conditions of implementation and technical requirements:
[0026] In the first step, the aluminum foil that has not been annealed and electrochemically polished is placed in a 6% oxalic acid solution with ethylene glycol as a solvent for the first anodic oxidation, the temperature is 10 ° C, and the current density is constant at 5 mA cm -2 , the oxidation time is 600s.
[0027] In the second step, the porous anodized aluminum oxide film obtained by the above oxidation is cleaned with deionized water, and the second step of anodic oxidation is carried out in a 5% ammonium sebacate solution with ethylene glycol as a solvent, and the temperature is 55 ℃, the current is constant at 7mA cm -2 , until the breakdown voltage (453V) is reached. In this process, under the action of electric field, Al 3+ Migrate to the electrolyte / oxide film interface, O 2- / OH - Migrating to the oxide film / metal interface, the aluminum ox...
Embodiment 3
[0030] This embodiment 3 is implemented under the following conditions of implementation and technical requirements:
[0031] In the first step, the aluminum foil that has not been annealed and electrochemically polished is placed in a 6% sulfuric acid solution with ethylene glycol as a solvent for the first anodic oxidation, the temperature is 25 ° C, and the current density is constant at 5 mA cm -2 , the oxidation time is 20min.
[0032]In the second step, the porous anodized aluminum oxide film obtained by the above oxidation is cleaned with deionized water, and the second step of anodic oxidation is carried out in a 5% boric acid solution with ethylene glycol as a solvent, the temperature is 60 ° C, and the current Constantly 10mA cm -2 , until the breakdown voltage (455V) is reached. In this process, under the action of electric field, Al 3+ Migrate to the electrolyte / oxide film interface, O 2- / OH - Migrating to the oxide film / metal interface, the aluminum oxide fi...
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Abstract
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