Making method for organic thin film transistor
A manufacturing method and organic thin film technology, applied in semiconductor/solid-state device manufacturing, electrical solid-state devices, semiconductor devices, etc., can solve problems such as poor stability, difficult to reach, difficult to dissolve, etc., and achieve the effect of device performance improvement
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Embodiment 1
[0027] Step 1, cleaning the ITO glass sheet corroded with hydrochloric acid, the glass sheet is used as the substrate 101, and the ITO is used as the grid 102;
[0028] Step 2, plating silicon dioxide with a thickness of 250 nanometers on the ITO as the gate insulating layer 103;
[0029] The SD400M-MULTISOURCE ORGANICMOLECULAR VAPOR DEPOSITION SYSTEM inorganic coating equipment and NG-3 electron beam evaporation power supply produced by Shenyang Star Vacuum Technology Application Research Institute were used to prepare silicon dioxide films; coating conditions: system vacuum degree 9.8E-4Pa, Foreline vacuum degree 1.OEOPa, growth rate 1 Ȧ / S, deposition time 45 minutes;
[0030] Step 3, transfer the sample treated in step 2 to 2wt% OTS solution (octadecyltrichlorosilane Acros-14740, octadecyltrichlorosilane, molecular formula is C 18 h 37 SiCl 3 , prepared with hexadecane) for 4 hours to form a self-assembled monolayer 104 on the gate insulating layer 103;
[0031] Step 4,...
Embodiment 2
[0038] The other steps are the same as in Example 1, except that the method of forming the self-assembled monolayer 104 on the gate insulating layer 103 is different; using a DEL multifunctional high vacuum system, it is prepared by thermal evaporation, and a few drops of 2wt% The OTS solution is pre-pumped so that the vacuum degree of the chamber is less than 3E-3Pa, and the vapor phase is deposited on the plated silicon dioxide. After 15 minutes of deposition, a self-assembled monolayer 104 is formed on the gate insulating layer 103 .
Embodiment 3
[0040] Other steps are the same as in Embodiment 1, the difference is that the material and formation method of the organic semiconductor layer 105 are different; the coating process of the organic semiconductor layer is carried out, and the pentacene derivative TES thienyl pentacene of the 6,13-substituent is used. Benzene, with the formula
[0041]
[0042] Prepare a 4wt% toluene solution, spin-coat at 2000rpm for 60 seconds and deposit on the sheet, then anneal in air at 90°C for 2 minutes, the precursor of the pentacene derivative is converted into a pentacene film, and the organic semiconductor layer 105 is obtained. .
[0043] Using the KEITHLEY 2410 source unit I-V test system to measure the I-V characteristic curve of organic thin film transistor devices, it is obtained that at different gate voltages V GS Next, the source-drain current I DS vs. source-drain voltage V DS The I-V relationship map, and then calculate the mobility in the saturation region according ...
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