Method for preparing GaAs micro/nono optical element

Abstract

The invention relates to a method for preparing a micron / nanometer optical element on GaAs and a micron / nanometer optical element thereof, in particular to a preparation method in which the micron / nanometer optical array element is directly etched on the surface of semiconductor GaAs material at one time with low cost, simple method and no complex processes such as mask lithography and so on. The quartz with the micron / nanometer optical array element is taken as an original mother blank; a relief structure on the quartz micron / nanometer optical array element is accurately replicated on the surface of polymer material and then a Ti layer and a Pt layer are sputtered in sequence; the surface is then metallized to obtain a template electrode. The template electrode is used as a working electrode and is adjusted to be parallel to a processed workpiece GaAs; an electrochemical etching solution is added into an electrolytic cell and an etching agent is generated on the template electrode; a restraint agent in the etching solution is used for compressing the thickness of an etching agent layer to the thickness of a micron or a nanometer level; GaAs sheets are controlled to move to the surface of the template electrode until the structure on the template electrode is completely replicated on the surface of the processed workpiece and the separation of the GaAs sheets and the template electrode is controlled.

Description

technical field [0001] The invention relates to a micro / nano optical element, in particular to a processing tool for polymer material / Ti / Pt prepared by using hot embossing technology combined with magnetron sputtering coating technology, and then using electrochemical confinement etching processing technology in semiconductor A processing method and device for processing micro / nano optical array element structure by etching the surface of GaAs material. Background technique [0002] Micro / nano optical elements refer to free optical curved surfaces and microstructured optical elements whose surface shape accuracy can reach submicron level and surface roughness can reach nanometer level. Due to its advantages of small size, light weight, flexible design, easy arraying and batch replication, it can complete new functions that traditional optical components cannot achieve, and can form many new optical systems (Zhou Haixian, Wang Yongnian, etc. Transl. Micro-optical components,...

AI Technical Summary

Problems solved by technology

The advantage of the optical processing method is that it can process any irregular surface lens (especially the binary optical element) and can be replicated on a large scale. The main disadvantage is that the processing steps are complicated and the processing cost is high, especially for some important Optical materials, such as quartz and GaAs, still have great difficulties in processing complex three-dimensional structures with continuous smoothness

The advantage of binary optical technology is that it cleverly overcomes the difficulties encountered in processing a continuous phase shape, and creates a novel and very important direction for the preparation of high-efficiency diffractive micro / nano optical elements, and can be used on a variety of materials processing; its main disadvantage is that this method needs multiple steps such as glue rejection, baking, development, etching, degumming, cleaning, etc. The alignment problem caused by re-making the pattern, due to the expensive process equipment and complicated processing steps, it will be an expensive and difficult process to add a step to obtain an optical element with high diffraction efficiency

The advantage of this method is that it cleverly uses the microlens array focusing projection lithography method to obtain optical elements at the micro / nano level; its main disadvantage is that the material it processes is limited to PDMS, which has relatively low plasticity. Strong polymer materials, but for most important optical materials, such as GaAs, quartz, etc., it cannot be processed

[0008] To sum up, so far, there is no low-cost, simple process, suitable for micro / nano optical element processing methods in various optical materials.

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