Microwave plasma flare waveguide excitation cavity

A technology of microwave plasma and excitation cavity, which is applied in the direction of plasma, discharge tube, electrical components, etc., can solve the problems of complex structure and increased cost, and achieve stable work, high utilization rate, high electron temperature and electron density Effect

Inactive Publication Date: 2009-03-04
UNIV OF ELECTRONIC SCI & TECH OF CHINA
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  • Abstract
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Problems solved by technology

Therefore, a quarter coaxial resonant cavity with one end short-circuited and the other end open-circuited, or a standing wave field formed by a compressed waveguide is usually used to increase the microwave electric field at the discharge position. These exciting devices often require

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  • Microwave plasma flare waveguide excitation cavity
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Embodiment Construction

[0014] Attached below figure 1 And the implementation case will further illustrate the present invention.

[0015] The structure diagram of the implementation case of the present invention is as follows figure 1 As shown, it includes the waveguide flange 1, the first section of rectangular waveguide 2, the second section of rectangular tapered waveguide 3, the third section of highly compressed narrow waveguide 4, the perforated metal diaphragm 5, the metal short-circuit plate 6, and the top of the narrow waveguide Cylinder 7, the outer conductor of the coaxial line at the bottom of the narrow waveguide 8, the inner conductor of the coaxial line at the bottom of the narrow waveguide 9, the metal nozzle 10, the quartz glass tube 11, the bottom tangential air inlet 12, and the observation hole 13 at the center of the short-circuit board , Generated plasma torch 14.

[0016] The specific parameter sizes of each part of this implementation case are described as follows:

[0017] This ...

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Abstract

The invention provides a micro-wave plasma torch waveguide excitation chamber, relates to an atmosphere microwave plasma torch (APT) excitation chamber without a built-in igniter under high pressure and belongs to the field of microwave plasma torch excitation technique. The excitation chamber consists of three sections of waveguides, a perforated metal film and a short circuit board; the microwave field strength of a discharging region is improved by dual measures of compressing the height of the narrow edge of the waveguide and forming a TE103 type resonator, thus saving the igniter or an ignitor and greatly improving the utilization ratio of the microwave power which is also called the conversion efficiency of the microwave discharging. Without any igniters or ignitors, the excitation chamber adopts smaller microwave power so as to use the excitation chamber to excite the microwave plasma torch (APT) under atmosphere pressure, has simple structure of device, high conversion efficiency, high torch electron temperature and electronic density and stable operation. The excitation chamber can be applied to a plurality of microwave industrial application technical fields, more especially used as the igniters of various boiler burners.

Description

Technical field [0001] The invention belongs to the field of microwave plasma torch excitation technology and devices, and particularly relates to the design and use of an atmospheric microwave plasma torch (APT) excitation cavity without a built-in igniter under high pressure. Background technique [0002] Microwave plasma is a quasi-balanced low temperature plasma with high electron density and temperature. Compared with direct current and radio frequency plasma, it has many advantages and particularities. Therefore, it has been widely used in the past ten years. Applications, especially in microelectronics technology, new material preparation and synthesis, aerospace technology, chemistry and chemical engineering, waste treatment, metal extraction, packaging materials and pharmaceutical industries, film deposition, plasma polymerization, microcircuit manufacturing to welding, tool hardening, Ultrafine powder synthesis, plasma spraying, plasma metallurgy, plasma chemical indust...

Claims

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Application Information

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IPC IPC(8): H05H1/30H01J37/32
Inventor 童玲陈彦张兆镗高博
Owner UNIV OF ELECTRONIC SCI & TECH OF CHINA
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