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Method for repairing noble metal target material

A repair method and precious metal technology, applied in metal material coating process, ion implantation plating, coating and other directions, can solve the problems of high cost of delamination and repair, and achieve the effect of simple process, low cost and easy operation

Active Publication Date: 2011-11-23
NORTHWEST INSTITUTE FOR NON-FERROUS METAL RESEARCH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method has strict requirements on the bonding interface between the filling material and the depletion area of ​​the original sputtering target, and delamination often occurs
In addition, the use of hot isostatic pressing equipment, the cost of repair is very high

Method used

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  • Method for repairing noble metal target material
  • Method for repairing noble metal target material

Examples

Experimental program
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Effect test

Embodiment 1

[0023] The 2mm×2mm Pt wire was washed with alkali to degrease, rinsed repeatedly with water, and dried in the air. Under argon protection, the used Pt target was repaired by welding with a welding current of 85A. The welded target is filled and repaired, and the argon gas flow rate is 8L / min.

Embodiment 2

[0025] The Φ2.2mm Au wire was washed with alkali to degrease, rinsed repeatedly with clean water, and dried in the air. Under argon protection, the used Au target was repaired by welding with a welding current of 70A. The welded target is filled and repaired, and the argon gas flow rate is 25L / min.

Embodiment 3

[0027] The 1.2mm × 2mm Pd wire was washed with alkali to remove oil, rinsed repeatedly with clean water, and dried in the air. Under argon protection, the used Pd target was repaired by welding with a welding current of 78A. The welded target is filled and repaired, and the argon gas flow rate is 30L / min.

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Abstract

The invention discloses a method for rehabilitating a noble metal target material. The method comprises the following steps: the noble metal target material with a sputtering loss region formed by the implementation of sputtering is subjected to alkali cleaning, oil removal, washing through clean water and dehydration through absolute ethyl alcohol; an upper protective hood and a lower protectivehood carry out the argon gas protection of inert gas on the noble metal target material; a wire material with the same texture with the target material and the local target material are melted through a tungsten electrode of an argon arc welding gun and are accumulated in the loss region; therefore, repeated accumulation is carried out so that the loss region is gradually piled flatly to finally become an accumulation state. The method has easy operation, simple process, no pollution and low cost; in the rehabilitating process, the noble metal material is hardly lost so as to realize the repeated use of the target material and substantially improve the utilization rate of the target material; the rehabilitated target material has no crack and no air hole; and the interface between the filled noble metal material and the original sputtering target is in metallurgical bonding of a welding state and have no delamination and the like.

Description

technical field [0001] The invention relates to a method for repairing noble metal targets widely used in material surface technology for ion sputtering. Background technique [0002] Ion sputtering technology is one of the important technologies for preparing thin films on the surface of materials. Since the 1990s, new devices and new materials in the microelectronics industry have developed rapidly, and electronic, magnetic, optical, photoelectric and superconducting thin films have been widely used in high-tech And the industrial field, prompting the sputtering target market to expand day by day. Sputtering technology has been widely used in information storage technology, microelectronics technology, lighting and display, computer science and material surface modification and other fields. The material that is bombarded by energetic ions in a vacuum state to achieve sputtering is called a target. The target is a key consumable material in the coating process. The perf...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/48
CPCC23C14/3414
Inventor 高广睿李争显杜继红王宝云严鹏陈玉斌
Owner NORTHWEST INSTITUTE FOR NON-FERROUS METAL RESEARCH
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