The invention belongs to the technical field of fruit and vegetable
drying, and particularly relates to an apple slice
drying method based on a
plasma technology. The
drying method comprises the following steps: performing
plasma pretreatment on fresh apple slices to obtain pretreated apple slices; the time of the
plasma pretreatment is 20 to 180 seconds; and performing hot
air drying on the pretreated apple slices to obtain
dried apple slices. According to the method, the fresh apple slices are firstly subjected to plasma pretreatment and then are dried, the
etching effect of plasma can promote internal
moisture of the apple slices to migrate to the surfaces,
moisture evaporation is accelerated, and the
drying time of the apple slices is shortened. According to the method, the drying efficiency of the apple slices can be remarkably improved, the
energy consumption is reduced, the color, the shape, the rehydration capacity and the sensory quality of the
dried apple slices are improved, the technical problems that in the prior art, the drying efficiency of the apple slices is low, and the product quality is reduced are solved, and a new technical approach is provided for high-value
processing and utilization of the apple slices.