Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Preparation of micro-nano lens array

A lens array, micro-nano technology, applied in the direction of nanostructure manufacturing, lens, nanotechnology, etc., can solve the problems affecting the efficiency of the lens, and achieve the effect of expanding the scope of use, simple preparation process, and wide preparation range

Inactive Publication Date: 2009-07-15
JIANGSU UNIV
View PDF0 Cites 29 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] There is an interface between the lens array and the substrate, which affects the efficiency of the lens

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparation of micro-nano lens array
  • Preparation of micro-nano lens array
  • Preparation of micro-nano lens array

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] The template material is prepared, and a deep hole with a diameter of 300nm is processed by electron beam etching; after cleaning the prepared microhole array template 1, the template 1 is placed in a glass dish, and 1~ 3 μL of monosilane, then put the glass dish in a vacuum drying oven, evacuate to below 1000Pa and heat to 80-90°C, keep it warm for 60-70min, keep the vacuum to cool the system naturally, and take out the template when it reaches room temperature. After silanization treatment, the surface energy of the template surface is reduced, so that the liquid is not easy to flow to the bottom of the micropores; then the PDMS replica material is prepared according to the mass ratio of 10:1, and the mixed PDMS replica material is placed in vacuum drying In the drying box, vacuumize the drying box until the internal pressure is lower than 100Pa, and let it stand for 10 minutes for degassing. Then pour the treated liquid PDMS 1 onto the template 2; place the template ...

Embodiment 2

[0035] The implementation process is basically the same as that of Example 1, the difference is that the electron beam etching method is used to process a 50nm hole array on the silicon wafer; then carry out silanization treatment and spread the PDMS liquid on the surface of the template; send the template together with PDMS Into the vacuum drying oven, vacuum to below 100Pa. According to P 0 -P=2σ / r, the radius of curvature of the concave spherical surface obtained at this time is 400 nm, and the depth of the concave cavity is 1 nm.

Embodiment 3

[0037] The implementation process is the same as in Example 1, the difference is that a 1mm hole array is processed on a silicon wafer by a conventional method, and silanization is performed; PDMS is poured on the surface of the template; the template with PDMS liquid is sent into In a vacuum drying oven, vacuumize to 9.995×10 5 Pa and 1×10 5 Between Pa, a 1mm lens can be obtained by curing and molding.

[0038] Other microlens arrays with different scales can be prepared according to the above method by controlling the vacuum degree of the oven and using a microhole array template with a required diameter.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
diameteraaaaaaaaaa
diameteraaaaaaaaaa
Login to View More

Abstract

The invention relates to a micronano device preparing technique which relates to the technical field of soft lithography, in particular to a technical method and a technique process for preparing a micronano lens array by adopting the soft lithography technique. The method comprises the following steps: firstly, preparing the micronano hole array by a conventional method on a template; secondly, performing silanization process to the prepared template; thirdly, adding the molding material PDMS on the surface of the template, placing the template coated with the PDMS inside a vacuum drying box so as to mold the PDMS fluid; solidifying the PDMS; and finally, separating the template from the PDMS and obtaining a PDMS membrane provided with the micro lens array. The method relieves the contradiction between the lens quality and the Millipore, easily controls the lens focus and has simple preparation technique and low requirement on the equipment.

Description

technical field [0001] The invention relates to the field of micro-nano device preparation technology and soft etching technology, in particular to a technical method and process for preparing micro-nano lens arrays using soft etching technology, which is suitable for using polydimethylsiloxane (PDMS) , Polymethacrylate (PMMA) and other soft etching materials surface micro-devices preparation. Background technique [0002] A lens is an optical component used to adjust the optical path system. It plays the role of changing the optical path and focusing during the propagation of light. It is an indispensable optical component of the optical system. Since the surface of the lens requires a specific shape and requires a high surface finish, its preparation has long been a problem. [0003] The micro-nano lens array is a micro-scale or nano-scale lens array distributed on a thin film light-transmitting material. Due to its special optical effect, it has been widely valued in aca...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B81C1/00B82B3/00G02B3/00
Inventor 周明李健李保家叶霞蔡兰
Owner JIANGSU UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com