Method for improving field emission performance of carbon nano tube film
A technology of carbon nanotube film and field emission, which is applied in the direction of nanotechnology, nanotechnology, nanostructure manufacturing, etc., can solve the problem of reducing the adhesion between carbon tube slurry and cathode electrode, affecting the uniformity of full-screen emission, and improving field emission performance Limited problems, to achieve the effect of increasing field emission current density, enhancing mechanical bonding, and high field enhancement factor
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Embodiment 1
[0018] Step 1, metal Ti is plated on the glass substrate by magnetron sputtering. The specific sputtering conditions are: background vacuum degree 4×10 -4 Pa, argon working pressure 3×10 -1 Pa, sink sputtering power 200W, sputtering time 20min, Ti thickness 300nm;
[0019] Step 2, depositing a carbon nanotube film on the surface of the metal Ti by means of electrophoretic deposition. The electrophoretic fluid consists of 4mg multi-walled carbon nanotubes and 10mg Mg(NO 3 ) 2 ·6H 2 O was prepared by adding 400ml of absolute ethanol. Electrophoretic deposition conditions are: electrode distance 2cm, electrophoresis voltage 10V, electrophoresis time 10min;
[0020] Step 3: Perform ultrasonic nano-welding on the electrophoresed sample, the ultrasonic frequency is 60kHz, the ultrasonic energy is 0.1J, the pressure is 0.2MPa, and the total area of the welding head is 1mm 2 The stainless steel lattice welding head, the size of each welding point (length × width) is 1um × 1um...
Embodiment 2
[0022] Step 1, metal W is plated on the silicon substrate by vacuum evaporation. The specific plating conditions are: vacuum degree 5×10 -4 Pa, argon working pressure 5×10 -1 Pa, sink sputtering power 200W, plating time 13min, W thickness 250nm;
[0023] Step 2, depositing a carbon nanotube film on the surface of the metal W by means of electrophoretic deposition. The electrophoretic fluid consists of 4mg single-walled carbon nanotubes and 10mg Mg(NO 3 ) 2 ·6H 2 O was prepared by adding 400ml of absolute ethanol. Electrophoretic deposition conditions are: electrode distance 2cm, electrophoresis voltage 20V, electrophoresis time 15min;
[0024] Step 3: Perform ultrasonic nano-welding on the electrophoresed sample, the ultrasonic frequency is 60kHz, the ultrasonic energy is 3J, the pressure is 0.3MPa, and the area of the welding head is 50mm 2 The stainless steel lattice welding head, the size of each welding point (length × width) is 10um × 10um, after welding for 1 se...
Embodiment 3
[0026] Step 1, metal Au is plated on the glass substrate by magnetron sputtering method. The specific sputtering conditions are: vacuum degree 5×10 -4 Pa, argon working pressure 5×10 -1 Pa, sputtering power 200W, sputtering time 10min, Au thickness 250nm;
[0027] Step 2, using electrophoretic deposition to deposit a carbon nanotube film on the surface of the metal Au. The electrophoretic fluid consists of 4mg multi-walled carbon nanotubes and 10mg Mg(NO 3 ) 2 ·6H 2 O was prepared by adding 400ml of absolute ethanol. Electrophoretic deposition conditions are: electrode distance 2cm, electrophoresis voltage 15V, electrophoresis time 20min;
[0028] Step 3: Perform ultrasonic nano-welding on the electrophoresed sample, the ultrasonic frequency is 60kHz, the ultrasonic energy is 5J, the pressure is 0.4MPa, and the area of the welding head is 100mm 2 The stainless steel lattice welding head, the size of each welding point (length × width) is 30um × 30um, after welding for...
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