Nickel ordered porous array film and preparation method thereof

A porous array and thin film technology, applied in the field of nickel ordered porous array thin film and its preparation, can solve the problems of restricting performance and wide application fields, complicated preparation of polystyrene single-layer colloidal crystal template, etc. Large, coercive force and remanence increase, the effect of scientific preparation methods

Inactive Publication Date: 2011-03-16
HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, no matter the synthesis method or the finished product, there are deficiencies. First, the preparation of the polystyrene single-layer colloidal crystal template is relatively complicated, and the organic surfactant SDS (Sodium Dodecylsulfate) needs to be used first according to a specific ratio. ) to dilute the suspension of polystyrene, and then place it in a humidity box to evaporate the solvent under ultrasonic conditions, and then obtain the polystyrene single-layer colloidal crystal template; secondly, due to the obtained single-layer colloid The polystyrene colloidal spheres on the crystal template are closely packed together, so the nickel silicide nano-dot array synthesized by the process of evaporating nickel on it and removing the polystyrene single-layer colloidal crystal template is just A lattice composed of isolated triangular nanoparticles of nickel, in which the nanoparticles are not connected with each other to form a thin film, which restricts its excellent performance and wide application fields when used as a thin film

Method used

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  • Nickel ordered porous array film and preparation method thereof
  • Nickel ordered porous array film and preparation method thereof
  • Nickel ordered porous array film and preparation method thereof

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Experimental program
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Effect test

Embodiment 1

[0022]The specific steps of preparation are as follows: step 1, first place the polystyrene suspension with a colloidal sphere diameter of 1000 nm on a rotating flat substrate to obtain a tightly packed single-layer colloidal crystal template, and then immerse the single-layer colloidal crystal template in water, After it is detached from the substrate and floats on the water surface, pick it up with a substrate of required material and shape, and make it cover the surface of the substrate, and then heat it at a temperature of 60°C for 15 minutes; The rotation speed of the substrate is 50r / min, the water is deionized water, and the substrate is a planar insulator. Afterwards, it was etched with plasma for 6 minutes under an argon atmosphere, and then heated at 60° C. for 15 minutes; wherein, the etching power was 18 W when plasma was etched, and the following figure 1 The non-densely packed monolayer colloidal crystal template shown.

[0023] Step 2, first place the single-la...

Embodiment 2

[0025] The specific steps of preparation are as follows: step 1, first place the polystyrene suspension with a colloidal sphere diameter of 1250nm on a rotating flat substrate to obtain a tightly packed single-layer colloidal crystal template, and then immerse the single-layer colloidal crystal template in water, After it is detached from the substrate and floats on the water surface, pick it up with a substrate of required material and shape, and cover it on the surface of the substrate, and then heat it at 80°C for 13 minutes; The rotation speed of the substrate is 60r / min, the water is deionized water, and the substrate is a planar insulator. Afterwards, it was etched with plasma for 25 min under an argon atmosphere, and then heated at 80° C. for 13 min; wherein, the etching power was 15 W when plasma was etched, and an approximate figure 1 The non-densely packed monolayer colloidal crystal template shown.

[0026] Step 2, first place the single-layer colloidal crystal tem...

Embodiment 3

[0028] The specific steps of preparation are as follows: step 1, first place the polystyrene suspension with a colloidal sphere diameter of 1500nm on a rotating flat substrate to obtain a tightly packed single-layer colloidal crystal template, and then immerse the single-layer colloidal crystal template in water, After it is detached from the substrate and floats on the water surface, pick it up with a substrate of required material and shape, and cover it on the surface of the substrate, and then heat it at a temperature of 100°C for 10 minutes; The rotation speed of the substrate is 65 r / min, the water is deionized water, and the substrate is a planar insulator. Afterwards, it was first placed in an argon atmosphere and etched with plasma for 50 minutes, and then heated at a temperature of 100 ° C for 8 minutes; wherein, the etching power was 12 W during plasma etching, and an approximate figure 1 The non-densely packed monolayer colloidal crystal template shown.

[0029] S...

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Abstract

The invention discloses a nickel ordered porous array film and a preparation method thereof. The film consists of nickel ordered porous arrays, holes in the arrays are regular hexagonal or circular and are arranged in a hexagonal period, the diagonals or the diameters of the holes are 650 to 1,600 nanometers, the hole pitch is 200 to 1,000 nanometers, the hole period is 1,000 to 2,000 nanometers,the thickness of the film is 20 to 50 nanometers, and the void ratio is 60 to 90 percent. The method comprises the following steps: firstly placing polystyrene suspension on a rotary planar substrateto obtain a single-layer colloidal crystal template, then heating the template for 6 to 15 minutes at the temperature of between 60 and 150 DEG C, later placing the template in argon atmosphere and etching the template for 6 to 100 minutes by plasma, heating the template for 0 to 15 minutes at the temperature of between 60 and 150 DEG C, thermally evaporating nickel metal to the treated template at the temperature of between 900 and 1,000 DEG C under the pressure of 1-9*10<-5>Pa, and placing the template in dichloromethane solution for supersonic treatment for 5 to 120 seconds to obtain the film. The nickel ordered porous array film and the preparation method thereof can be applied in the fields of high-density magnetic storage media, sensors, invisible materials, efficient catalysts and the like.

Description

technical field [0001] The invention relates to a nickel film and a preparation method thereof, in particular to a nickel ordered porous array film and a preparation method thereof. Background technique [0002] As a new generation of high-density magnetic storage media, nickel ordered porous array films have attracted widespread attention. Due to the interaction between the intrinsic anisotropy of the nickel ordered porous film and the demagnetization field of the film, a stable magnetic chip structure is formed around the ordered holes, and a magnetic recording unit is formed between adjacent holes. Compared with the magnetic nano-discrete unit array structure, this nickel ordered porous array film has the advantages of high Curie temperature, stable magnetic recording, high magnetic recording density and will not be affected by superparamagnetism. In addition, the nickel ordered porous array film There are potential applications in sensors, stealth materials and efficien...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/04C23C14/14H01F10/14G11B5/62G11C11/14
Inventor 杨金伶段国韬蔡伟平刘培生
Owner HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI
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