Hollow cathode electric arc ion coating plating system

A cathodic arc and coating system technology, applied in the direction of ion implantation plating, coating, vacuum evaporation plating, etc., can solve the problem that can not meet the requirements of thick coatings, can not meet the requirements of wear and corrosion resistance, filter technology deposition rate It can improve the coating efficiency and ion plating effect, be easy to control, and improve the coating deposition rate.

Inactive Publication Date: 2010-04-28
WUHAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the biggest problem with the use of filtration technology is that the deposition rate drops significantly (generally less than 2μm/h)
[0005] Many existing coating products (such as automobile piston rings) not only require high hardness (greater than HV1000) and density (no particle pollution) of the coating, but also many products require coating thickness of 50-100 microns. Conventional arc ion plating needs to be plated for

Method used

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  • Hollow cathode electric arc ion coating plating system
  • Hollow cathode electric arc ion coating plating system
  • Hollow cathode electric arc ion coating plating system

Examples

Experimental program
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Effect test

Embodiment 1

[0029] Embodiment 1: under the condition of 0.02Pa, negative 200V bias, utilize the metal Ti arc target controlled by electromagnetic field to prepare pure Ti metal transition layer; the deposition thickness of metal transition layer is 100-200 nanometers; Pass into nitrogen then, air pressure maintains 1Pa , Open the arc target on the furnace wall, and use nitrogen to react with Ti sputtered from the target surface to form TiN. The preparation temperature is 400-450°C, and the bias voltage is negative 200V. The thickness of TiN coating is 20-30 microns. The flow rate of nitrogen gas is 50-200 sccm; the current of the hollow cathode arc target is 300A.

[0030] The control of the above-mentioned hollow cathode arc target control surface arc target is produced by an electromagnetic coil placed behind the arc target. A uniformly distributed magnetic field with a strength of 50-60 Gauss is generated on the target surface.

Embodiment 2

[0031] Embodiment 2: Under the condition of 0.05Pa, negative 150V bias, the metal Cr arc target controlled by electromagnetic field is used to prepare pure Cr metal transition layer; the deposition thickness of metal transition layer is 200-300 nanometers; then pass into nitrogen, and the air pressure is maintained at 2.3 Pa, open the arc target on the furnace wall, and use nitrogen to react with Cr sputtered from the target surface to form CrN. The preparation temperature is 400-450°C, and the bias voltage is negative 150V. The thickness of CrN coating is 20-30 microns. The flow rate of nitrogen gas is 180-250 sccm; the current of the hollow cathode arc target is 350A.

[0032] The control of the above-mentioned hollow cathode arc target control surface arc target is produced by an electromagnetic coil placed behind the arc target. A uniformly distributed magnetic field with a strength of 60-70 Gauss is generated on the target surface.

Embodiment 3

[0033] Embodiment 3: Under the condition of 0.04Pa, negative 250V bias, utilize the metal Zr electric arc target of electromagnetic field control to prepare pure Zr metal transition layer; The deposition thickness of metal transition layer is 300-400 nanometer; Pass into nitrogen then, air pressure keeps 3.3 Pa, open the arc target on the furnace wall, and use nitrogen to react with Zr sputtered from the target surface to generate ZrN. The preparation temperature is 350-450°C, and the bias voltage is negative 250V. The thickness of the ZrN coating is 25-50 microns. The flow rate of nitrogen gas is 250-300 sccm; the current of the hollow cathode arc target is 400A.

[0034] The control of the above-mentioned hollow cathode arc target control surface arc target is produced by an electromagnetic coil placed behind the arc target. A uniformly distributed magnetic field with a strength of 70-80 Gauss is generated on the target surface.

[0035] figure 1 It is a self-made high-d...

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Abstract

The invention discloses a hollow cathode electric arc ion coating plating system, comprising a vacuum chamber provided with a vacuumizing port. A cathode electric arc target and a work rest are arranged in the vacuum chamber; the vacuum chamber is isolated from earth; the inner wall of the vacuum chamber is provided with a target material which is connected with a power cathode to form a hollow cathode electric arc target; and the work rest is located in the central zone of space surrounded by the hollow cathode electric arc target. The invention is different from the common electric arc ion plating technology. The invention adopts a rotatable electromagnetism coil to produce a controlled arc magnetic field, and the rotation speed of the coil can be adjusted by adjusting the rotation speed of the motor. The invention substantially improves common electric arc ion plating technology, proposes hollow cathode electric arc ion plating technology for the first time, greatly improves the deposition efficiency of the coating and simplifies coating equipment. The invention has the characteristics of high plating efficiency, low cost, convenient operation and the like, can satisfy the requirements of industrial ultra-thick coating and has better application prospect.

Description

technical field [0001] The invention relates to a hollow cathode arc ion plating coating system, which belongs to the technical field of thin films. Background technique [0002] Ion plating technology was first proposed by D.M.Mottox in 1963. With the continuous development of its technology, the main ion plating technologies currently used include: active reactive evaporation ion plating (ARE), hollow cathode ion plating (HCDIP), induction heating ion plating, arc ion plating (AIP) and so on. Each of these methods has its own advantages and disadvantages, but arc ion plating is the most successful application. After entering the 1990s, ion plating technology has made great progress. It has replaced various other types of ion plating and has become the most widely used production process for functional coatings. [0003] Arc ion plating is a method of igniting an arc under vacuum and using the generated low-temperature plasma to deposit a coating. It can significantly i...

Claims

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Application Information

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IPC IPC(8): C23C14/32
Inventor 杨兵丁辉
Owner WUHAN UNIV
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