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Heat treatment method of solar-grade silicon crystal

A heat treatment method and solar-grade technology, applied in the directions of post-processing, crystal growth, post-processing details, etc., can solve the problems affecting the photoelectric conversion efficiency and life of crystalline silicon solar cells, reducing the diffusion length of minority carriers, and affecting the performance of photovoltaic devices, etc. The effect of improved resistivity and resistivity distribution, easy industrial production, and easy handling

Inactive Publication Date: 2011-01-12
GREENERGY CRYSTAL TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

These traps and recombination centers reduce the minority carrier diffusion length, affecting the performance of photovoltaic devices
It is specifically manifested in the fact that the minority carrier life of silicon wafers made of the above-mentioned silicon single crystal and silicon polycrystalline is relatively low, and ultimately affects the photoelectric conversion efficiency and life of the manufactured crystalline silicon solar cells.

Method used

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  • Heat treatment method of solar-grade silicon crystal
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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0035] A 6.5-inch solar-grade gallium-doped monocrystalline silicon crystal prepared by the Czochralski method commonly used in the solar industry.

[0036] Take a section of 200 mm long from the head of the single crystal silicon crystal (the part that is first pulled out of the crucible), and the resistivity distribution of the upper end surface (the part that is first solidified) is as follows: figure 2 As shown in the curve before treatment, the minority carrier lifetime distribution is as follows figure 1The curve before processing is shown in the middle. Put the above-mentioned single crystal silicon crystal into a vacuum heating furnace. After the furnace is evacuated to below 5Pa, a mixed gas of argon and hydrogen with a volume ratio of 1:1 is introduced, and the flow rate of the protective gas passing through the surface area of ​​the silicon crystal is 2.5-100 slpm / m 2 , so that the vacuum degree in the furnace reaches about 1000Pa under the action of the vacuum p...

Embodiment 2

[0038] The silicon crystal was processed using the process of Example 1, except that the protective gas was 100% hydrogen, and the flow rate of the protective gas and the pumping rate of the vacuum pump were properly adjusted to control the pressure in the furnace at about 500 Pa.

Embodiment 3

[0040] The silicon crystal was processed using the process of Example 1, except that the silicon crystal was a single crystal silicon ingot grown by directional solidification.

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Abstract

The invention discloses a heat treatment method of a solar-grade silicon crystal, which comprises the steps of placing the silicon crystal into a vacuum heating furnace, introducing protective gas into the vacuum heating furnace and leading the protective gas to flow through the surface of the silicon crystal during the heat treatment process of the silicon crystal, wherein the protective gas is a) gas containing hydrogen atoms; or b) mixture of the gas containing the hydrogen atoms and inert gas. The adoption of the method for carrying out heat treatment on the silicon crystal can significantly prolong the minority carrier lifetime of the silicon crystal, simultaneously regulate the distribution uniformity of radial resistivity of the silicon crystal and lead the resistivity of the silicon crystal to be more uniform on the radius direction of the crystal due to the roles of passivation, impurity absorption and the like of H to impurities and defects in the silicon crystal. The method is simple to operate and easy to carry out industrial production, and can significantly improve the quality of a product.

Description

technical field [0001] The invention relates to a heat treatment method for silicon crystals, in particular to a heat treatment method for silicon crystals used in solar cells with high conversion efficiency. Background technique [0002] The raw silicon crystals used in the preparation of crystalline silicon solar cells are divided into silicon single crystals or silicon polycrystals. In the process of silicon crystal preparation, due to the different raw materials or processing processes, there are metal impurities, oxygen and carbon impurities, grain boundaries, dislocations, voids (point defects) and other defects inside the silicon material, and these impurities and defects often form many unidentified Saturated dangling bonds form electroactive centers and become traps and recombination centers for minority carriers (minority carriers). These traps and recombination centers reduce the minority carrier diffusion length and affect the performance of photovoltaic devices...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B33/02C30B29/06
Inventor 李乔马远
Owner GREENERGY CRYSTAL TECH
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