Method for preparing anode of lithium sulfur battery
A lithium-sulfur battery and positive electrode technology, applied in the field of electrochemical batteries, can solve the problems of battery performance degradation, reduced positive electrode conductivity, unfavorable sulfur conductivity, etc., and achieve the effects of high battery discharge specific capacity and cycle stability improvement.
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Embodiment 1
[0018] Cut the copper foil with a flat surface into a disc with a diameter of 11mm, wipe the disc with a cotton ball soaked in acetone for 2 minutes, then ultrasonically clean it with distilled water for 3 minutes, take it out and dry it;
[0019] Put the treated copper foil into the cavity of a DC magnetron sputtering device. The target used for sputtering is a high-purity graphite target with a diameter of 50 mm. The distance between the target and the copper foil is adjusted to 60 mm. The steam is carried into the cavity, and the air pressure in the cavity is reduced to 1×10 before the gas is introduced. -3 Pa; when ventilating, adjust the total flow rate of nitrogen and carbon disulfide vapor to 20 sccm (ml / min under standard conditions), control the pressure in the chamber to 0.6 Pa, and adjust the sputtering power to 150W. Plasma is formed under the action of radio frequency voltage, and the ionized sputtering gas sputters the high-purity graphite target, deposits a carb...
Embodiment 2
[0021] Cut the nickel foil with a flat surface into a disc with a diameter of 13mm, wipe the disc with a cotton ball soaked in acetone for 2 minutes, then ultrasonically clean it with distilled water for 3 minutes, take it out and dry it;
[0022] Put the treated nickel foil into the cavity of the DC magnetron sputtering device. The target used for sputtering is a high-purity graphite target with a diameter of 50 mm. The distance between the target and the nickel foil is adjusted to 60 mm. The carbon disulfide vapor is carried into the chamber, and the air pressure in the chamber is reduced to 1×10 before the gas is introduced. -3 Pa; adjust the total flow of argon and carbon disulfide vapor to 30 sccm during ventilation, control the pressure in the chamber to 0.8Pa, adjust the sputtering power to 160W, and the sputtering gas forms plasma under the action of DC voltage or RF voltage input by the sputtering device The ionized sputtering gas sputters the high-purity graphite tar...
Embodiment 3
[0024] Cut the aluminum foil with a flat surface into a disc with a diameter of 12mm, wipe the disc with a cotton ball soaked in acetone for 2 minutes, then ultrasonically clean it with distilled water for 3 minutes, take it out and dry it;
[0025] Put the processed aluminum foil into the cavity of the radio frequency magnetron sputtering device. The target used for sputtering is a high-purity graphite target with a diameter of 50 mm. The distance between the target and the aluminum foil is adjusted to 50 mm. The carbon disulfide vapor is carried by nitrogen gas. To the cavity, the air pressure in the cavity before the gas is introduced is reduced to 1×10 -3 Pa; adjust the total flow of nitrogen and carbon disulfide vapor to 50 sccm during ventilation, control the pressure in the chamber to 1.2Pa, adjust the sputtering power to 170W, and the sputtering gas forms plasma under the action of DC voltage or RF voltage input by the sputtering device , the ionized sputtering gas spu...
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