Friction induction-based single crystal quartz surface selective etching method

A single crystal quartz, friction-induced technology, applied in crafts for producing decorative surface effects, decorative arts, gaseous chemical plating, etc., can solve problems such as plastic deformation, scanning probe wear, large wear debris, etc. Precise and controllable etched shape, improved processing efficiency and less wear

Inactive Publication Date: 2012-07-11
SOUTHWEST JIAOTONG UNIV
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method will inevitably produce a large amount of abrasive debris, and the wear of the scanning probe is also very serious
In addition, the edge of the material after cutting will produce severe plastic deformation, which will affect the properties of the material
The anodic oxidation method based on the atomic force microscope can use in-situ anodic oxidation to process a mask on the surface of a conductor or semiconductor, combined with chemical corrosion, can process nanostructures, but this method cannot be applied to the surface of insulators such as quartz

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Friction induction-based single crystal quartz surface selective etching method
  • Friction induction-based single crystal quartz surface selective etching method
  • Friction induction-based single crystal quartz surface selective etching method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0032] A specific embodiment of the present invention is a method for selectively etching the surface of single crystal quartz based on friction induction, and its specific operation method is:

[0033] A. Install the probe with spherical crown on the atomic force microscope, fix the cleaned single crystal quartz on the sample stage of the atomic force microscope, start the atomic force microscope, apply a constant load F to the probe, and make the probe along The set trajectory and number of cycles are scanned on the single crystal quartz surface, and the scanning rate is 12 μm / s during processing.

[0034] The value of the fixed load F in this example is 5μN, which is the theoretical critical load value F calculated according to the Hertz contact formula when the single crystal quartz surface is damaged during processing y = 0.047 times of 106 μN.

[0035] The processed single crystal quartz is specifically X-cut single crystal quartz, and the spherical crown probe used is ...

Embodiment 2

[0041] The specific operation method in this example is:

[0042] A. Install the probe with spherical crown on the atomic force microscope, fix the cleaned single crystal quartz on the sample stage of the atomic force microscope, start the atomic force microscope, apply a constant load F to the probe, and make the probe along The set trajectory and number of cycles are scanned on the single crystal quartz surface.

[0043] The value of the fixed load F in this example is 8μN, which is the theoretical critical load value F calculated according to the Hertz contact formula when the single crystal quartz surface is damaged during processing y = 0.075 times of 106 μN.

[0044] The material type of the single crystal quartz processed in this example and the spherical crown probe used are exactly the same as those in Example 1. Therefore, the critical load F corresponding to the yield of the single crystal quartz y Also 106 μN.

[0045] B. Place the scanned single-crystal quartz ...

Embodiment 3

[0051] The specific operation method in this example is:

[0052] A. Install the probe with a spherical crown on the atomic force microscope, fix the cleaned single crystal quartz on the sample stage of the atomic force microscope, start the atomic force microscope, apply a variable load F' to the probe, and make the probe along the The single crystal quartz surface is scanned according to the set trajectory and number of cycles, and the scanning rate during processing is 12 μm / s.

[0053] The variation range of the variable load F' in this example is the theoretical critical load value F calculated according to the Hertz contact formula when the single crystal quartz surface is damaged during processing y (106μN) is 0.03-0.14 times, that is, the variation range of the variable load F' is 3.2μN-15μN.

[0054] The material type of the single crystal quartz processed in this example and the spherical crown probe used are exactly the same as those in Example 1. Therefore, the cr...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
heightaaaaaaaaaa
lengthaaaaaaaaaa
widthaaaaaaaaaa
Login to view more

Abstract

The invention discloses a friction induction-based single crystal quartz surface selective etching method. The method comprises the following steps of: arranging a probe with ball coronary tip on an atomic force microscope, fixing single crystal quartz on a sample platform, starting the atomic force microscope, and applying constant load F or variable load F' to the probe, wherein the value of the F or the variable range of the F' is 0.03 to 0.14 times critical load Fy of yield on the quartz surface; performing scanning on the surface of the single crystal quartz along the set track and cycletimes by the probe; and after scanning, corroding the single crystal quartz for over 2.5 hours by using 15 to 25 percent KOH solution. The method can effectively perform nano processing by combining scanning under extremely low load and subsequent corrosion, does not need a mask or repeated corrosion, and can process a multistage nano structure. The method does not damage or pollute the structureand the surface outside the processed area, and is a simple, accurate and clean nano quartz processing method.

Description

technical field [0001] The invention relates to a micro-nano processing method of quartz. Background technique [0002] Micro-nano devices are widely used in advanced manufacturing, aerospace, military, biotechnology, computer and communication and other fields. Quartz not only has good electrical insulation and chemical stability, but also can easily convert acceleration, pressure, etc. into electrical signals, and is a piezoelectric material with excellent performance. Therefore, quartz is an important material for the manufacture of micro-nano devices, and is often used to manufacture micro-accelerometers, micro-pressure sensors, biochips, and insulating substrates for micro-electromechanical systems. [0003] According to different processing principles, the current processing methods for quartz micro-devices mainly include: (1) Focused ion beam processing: use an external high-voltage electric field to accelerate metal ions, and form a directional high-energy ion beam ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): B81C1/00
Inventor 钱林茂宋晨飞周仲荣余家欣余丙军陈磊
Owner SOUTHWEST JIAOTONG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap