Environment-friendly biological texture etch solution and application method thereof
A bio-environmental protection and application method technology, applied in chemical instruments and methods, crystal growth, final product manufacturing, etc., can solve the problems of uneven quality of isopropanol, endanger the survival of all species, easily pollute the working environment, etc., and achieve raw material Stable source, good storage stability, good reproducible effect
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Example Embodiment
[0022] Example one:
[0023] First, pour 8.6 kg of deionized water into the washed texturing tank, and add 0.5 kg of sodium citrate, 0.9 kg of anhydrous sodium carbonate and 20 ppm of alkyl glycoside BG-10 during the stirring process. Stir evenly to prepare a bio-environmental-friendly texturing liquid, and heat it to 80°C. Take the cut single crystal silicon wafer and put it in an ultrasonic bath filled with deionized water for 10 minutes, and then put the silicon wafer into the texturing tank for texturing for 25 minutes. Finally, take out the silicon wafer and put it in an ultrasonic bath filled with deionized water for ultrasonic rinsing for 10 minutes.
[0024] After the solar single wafer is textured with the above-mentioned texturing liquid, the resulting suede pyramid is small, uniform, and has a high coverage rate, and the quality difference before and after the single-chip texturing is 0.4g.
Example Embodiment
[0025] Embodiment two:
[0026] First, pour 9.5 kg of deionized water into the washed texturing tank, and add 0.2 kg of sodium citrate, 0.3 kg of anhydrous sodium carbonate and 10 ppm of alkyl glycoside APG1214 during the stirring process. Stir evenly to prepare a bio-environmental-friendly texturing liquid, and heat it to 85°C. Take the cut monocrystalline silicon wafer and put it in an ultrasonic bath filled with deionized water for 15 minutes, and then put the silicon wafer in the texturing tank for texturing for 30 minutes. Finally, take out the silicon wafer and put it in an ultrasonic bath filled with deionized water for ultrasonic rinsing for 15 minutes.
[0027] After the solar single wafer is textured with the above-mentioned texturing liquid, the resulting suede pyramid is small, uniform, and has a high coverage rate, and the quality difference before and after the single-chip texturing is 0.1g.
Example Embodiment
[0028] Embodiment three:
[0029] First, pour 7.7 kg of deionized water into the washed texturing tank, and add 0.8 kg of sodium citrate, 1.5 kg of anhydrous sodium carbonate and 80 ppm of alkyl glycoside BG-10 during the stirring process. Stir evenly to prepare a bio-environmental-friendly texturing liquid, and heat it to 75°C. Take the cut single crystal silicon wafers and put them in an ultrasonic bath filled with deionized water for 5 minutes, and then put the silicon wafers in the texturing tank for texturing for 10 minutes. Finally, the silicon wafer was taken out and placed in an ultrasonic bath filled with deionized water for ultrasonic rinsing for 5 minutes.
[0030] After the solar single wafer is textured with the above-mentioned texturing liquid, the resulting suede pyramid is small, uniform, and has a high coverage rate, and the quality difference before and after the single-chip texturing is 1.0g.
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