Silicon nanowire grating resonant enhanced photoelectric detector and manufacturing method thereof
A photodetector and silicon nanowire technology, applied in circuits, electrical components, semiconductor devices, etc., to achieve the effects of improving quantum efficiency, enhancing light field, and reducing source-drain bias voltage
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[0052] Please refer to figure 1 According to the invention, a silicon nanowire grating resonance enhanced photodetector can be fully compatible with CMOS technology, and is suitable for the application of optoelectronic hybrid integrated circuit (OEIC).
[0053] First, select a silicon substrate 11 (400 μm)-silicon oxide layer 12 (300nm)-an SOI (or SIMOX) sheet with a thin intrinsic top silicon layer (200nm) structure; thermally oxidize the 200nm-thick top-layer silicon at 900°C to obtain a 30nm-thick Thermal silicon oxide layer; cover the sample with 1 μm thick photoresist AZ6130, and then photo-etch the mask pattern of the I-shaped mesa 13 after pre-baking. After the silicon oxide is etched by ICP, the top silicon thin layer is etched by ICP. The silicon thin layer forms the I-shaped mesa 13 . Next, cover the sample with a 200nm thick photoresist PMMA950K, and dry it on a hot plate at 180°C for 90 seconds; use an electron beam exposure sleeve to carve out the mask layer of ...
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