High adhesiveness silicone resin composition and an optical semiconductor device provided with a cured product thereof
A silicone resin and composition technology, applied in semiconductor devices, electrical components, circuits, etc., can solve problems such as high heat generation and cracking, and achieve high heat resistance, high light resistance, discoloration resistance and impact resistance excellent effect
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[0102] Examples and comparative examples are listed below to specifically describe the present invention, but the present invention is not limited to the following examples. In addition, the part in the following description shows a weight part.
[0103] Preparation of organopolysiloxane with resin structure
Synthetic example 1
[0105] Add 1050g of xylene and 5143g of water to the flask, then dropwise add 2222g (10.5mol) of phenyltrichlorosilane, 543g (4.50mol) of vinyl dimethyl chlorosilane, and 1575g of xylene. The solution. After completion of the dropwise addition, the mixture was stirred for 3 hours, and the spent acid was separated and washed with water. After azeotropic dehydration, 6 g (0.15 mol) of KOH was added, and the mixture was heated to reflux at 150° C. overnight. Then neutralize and filter with 27g (0.25mol) of trimethylchlorosilane and 24.5g (0.25mol) of potassium acetate, and distill off the solvent under reduced pressure to synthesize a siloxane resin represented by the following average formula (Resin 1). The vinyl equivalent is 0.195 mol / 100g.
[0106]
Synthetic example 2
[0108] Add 1005g of xylene and 5000g of water to the flask, then dropwise add 2222g (10.5mol) of phenyltrichlorosilane, 422g (3.50mol) of vinyl dimethyl chlorosilane, and 1507g of xylene. The solution. After completion of the dropwise addition, the mixture was stirred for 3 hours, and the spent acid was separated and washed with water. After azeotropic dehydration, 6 g (0.15 mol) of KOH was added, and the mixture was heated to reflux at 150° C. overnight. Then neutralize and filter with 27g (0.25mol) of trimethylchlorosilane and 24.5g (0.25mol) of potassium acetate, and distill off the solvent under reduced pressure to synthesize a siloxane resin represented by the following average formula (Resin 2). The vinyl equivalent is 0.170 mol / 100g.
[0109]
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