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Holographic grating manufactured by HfO2/SiO2 sol-gel glass

A sol-gel and glass technology, applied in the field of dense wavelength division multiplexing holographic grating, can solve the problems of complex process and high cost, and achieve the effects of high purity, cost saving and good uniformity

Inactive Publication Date: 2014-01-15
XIAN GERUIWEINA PHOTOELECTRIC TECH
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

[0003] The object of the present invention is to provide a kind of HfO with photosensitivity 2 / SiO 2 A method for making a diffraction grating from sol-gel glass, which solves the problems of complex process, ghost lines and stray light, and high cost in the background technology

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  • Holographic grating manufactured by HfO2/SiO2 sol-gel glass
  • Holographic grating manufactured by HfO2/SiO2 sol-gel glass
  • Holographic grating manufactured by HfO2/SiO2 sol-gel glass

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Embodiment Construction

[0022] The invention adopts the sol-gel method to prepare the inorganic modified silicate composite optical material. by SiO 2 Organic molecules are introduced into the structural network of inorganic materials to obtain new optical materials with superior performance. The sol-gel method has great potential in the preparation of multifunctional optical materials due to its mild reaction conditions and flexible operation methods: such as the synthesis of stable semiconductor quantum dots, the doping of quantum dots with organic matrices, and the synthesis of organic / inorganic matrix materials . Compared with other methods, the sol-gel method has advantages in preparing organically modified silicate optical materials such as: low reaction temperature, ensuring that organic or organic active molecules maintain their physical and chemical properties; the reaction starts from a solution, and the reaction group The components are mixed evenly at the nanometer level, reducing light...

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Abstract

The invention provides a method for manufacturing diffraction grating by HfO2 / SiO2 sol-gel glass with photosensitivity. According to the invention, a ratio of HfO2 to SiO2 in the HfO2 / SiO2 sol-gel glass is changed so as to improve a reflective index of a mixing system, a threshold value of anti-radiation damage and heat stability. X ray is used as exposure light source; a solubility difference between an exposure part and an unexposed part is utilized; and diffraction grating is prepared on a thin film of the HfO2 / SiO2 sol-gel glass. According to the invention, problems in background technology are solved, wherein the problems include complicated technology, existence of ghost lines and stray lights, and huge cost. Besides, according to the invention, ion etching is not needed; the manufacturing method is simple; equipment is easy to operate; the cost is low; the diffraction efficiency is high; and the heat stability is good. The holographic grating provided in the invention is mainly applied to a capacity-expanding dense wavelength division multiplexer of an optical fiber communication system.

Description

technical field [0001] The invention relates to a dense wavelength division multiplexing holographic grating for optical fiber communication, in particular to a photosensitive HfO 2 / SiO 2 DWDM holographic gratings fabricated from sol-gel glass. Background technique [0002] Traditional diffraction gratings mainly include ruled gratings and holographic gratings. The quality of ruled gratings depends on the accuracy of the grooves and bearings of the scriber. Due to periodic errors in the position of the grooves, false spectral images are generated; holographic gratings are developed using the interference phenomenon of light emitted by lasers. The position of the groove is determined by the interference conditions, and there is no random error and periodic error of marking the grating. HfO 2 / SiO 2 Sol-gel glass holographic gratings with photosensitivity HfO 2 / SiO 2 The sol-gel glass is used to prepare the diffraction grating, which saves the tedious etching steps in ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/18G03F7/00
Inventor 谢永军
Owner XIAN GERUIWEINA PHOTOELECTRIC TECH