A kind of cleaning solution for flat panel display and preparation method thereof

A flat-panel display and cleaning liquid technology, applied in the direction of chemical instruments and methods, detergent compounding agents, detergent compositions, etc., can solve environmental pollution and other problems, and achieve the effect of strong cleaning ability

Active Publication Date: 2011-12-28
绵阳艾萨斯电子材料有限公司
View PDF1 Cites 12 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, some traditional cleaning agents contain fluorine-containing substances that destroy the ozone l

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A kind of cleaning solution for flat panel display and preparation method thereof
  • A kind of cleaning solution for flat panel display and preparation method thereof
  • A kind of cleaning solution for flat panel display and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] The components in the following percentages by weight are stirred evenly at room temperature to obtain the cleaning solution provided by the invention: surfactant compound APG0810 shown in formula I 5%, organic solvent diethylene glycol monomethyl ether 10%, chelating agent EDTA 1% 1%, antiseptic sorbitol 1%, n is the defoamer monododecyl nonaethylene glycol ether (trade name laureth-9) 0.1% and deionized water 82.9% shown in the formula II of 12; The resistivity of deionized water is 20 megohms, and the total metal ion concentration is 50ug / L.

[0022] Add the above cleaning solution into an ultrasonic cleaning machine, raise the temperature to 50°C, put the TFT panel in the cleaning solution, turn on the ultrasonic wave, and clean for 3 minutes. Next, the cleaned glass panel was washed in deionized water at 50° C. for 3 minutes under the same cleaning conditions, and then dried in an oven.

[0023] Using a scanning electron microscope (SME) (Hitachi, S-4700) to magni...

Embodiment 2

[0025] Stir the components in the following percentages by weight evenly at room temperature to obtain the cleaning solution provided by the invention: surfactant compound APG0810 shown in formula I 10%, organic solvent butyl carbitol 15%, chelating agent EDTA 0.5% , preservative benzotriazole 1.5%, n is the antifoaming agent monododecyl nonaethylene glycol ether (trade name laureth-9) shown in the formula II of 12 0.1%, deionized water 72.9%; The deionized water has a resistivity of 20 megohms and a total metal ion concentration of 50 ug / L.

[0026] Add the above-mentioned cleaning solution into the cleaning tank, raise the temperature to 50° C., put the etched glass panel (Al—Si—Cu wiring) into it, soak it for 30 minutes, and let it stand still. Next, the cleaned glass panel was immersed in 25° C. deionized water for 3 minutes, and then the panel was taken out, and the same operation was repeated. Dry with a stream of nitrogen.

[0027] Using a scanning electron microscope...

Embodiment 3

[0029] Stir the components in the following percentages by weight evenly at room temperature to obtain the cleaning solution provided by the invention: 20% of surfactant compound APG0814 shown in formula I, 30% of organic solvent diglyme, chelating agent diethylene glycol dimethyl ether Ethyltriaminepentaacetic acid 5%, preservative sorbitol 5%, n is the defoamer monododecyl nonaglycol ether (trade name laureth-9) shown in formula II of 12 5% , 35% deionized water; the resistivity of the deionized water is 25 megohm, and the total metal ion concentration is 50ug / L.

[0030] Add the above-mentioned cleaning solution into the cleaning tank, raise the temperature to 50° C., put the etched glass panel (Al—Si—Cu wiring) into it, soak it for 30 minutes, and let it stand still. Next, the cleaned glass panel was immersed in 25° C. deionized water for 3 minutes, and then the panel was taken out, and the same operation was repeated. Dry with a stream of nitrogen.

[0031] Using a scan...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses cleaning fluid for panel display and a preparation method thereof. The cleaning fluid comprises the following components in the formula I in percentage by weight: 1 percent to 20 percent of surfactant, 5 percent to 30 percent of organic solvent, 0.5 percent to 5 percent of chelating agent, 0.01 percent to 5 percent of preservative, 0.01 percent to 5 percent of antifoaming agent and the balance of water. The cleaning fluid has the characteristics that metal ions, organic and inorganic impurities and solid particles on a glass substrate can be effectively removed; the cleaning capability is strong; the cleaning fluid has no pollution to the environment; after being cleaned by the cleaning fluid, the substrate is not corroded; and the like.

Description

technical field [0001] The invention relates to a cleaning solution for flat panel display and a preparation method thereof. Background technique [0002] In the field of flat panel display, including liquid crystal display (LCD) (specifically including twisted nematic (TN), super twisted nematic (STN) and color super twisted nematic (CSTN)), touch screen (TP), electromechanical The preparation process of glass substrates for luminescence (OLED) and plasma (PDP) displays includes sequentially performing on the glass substrate: the metal wiring formation process of setting a metal or metal oxide layer; the process of setting a photoresist layer; process; the exposure process of transferring the mask pattern on the photoresist; the etching process of etching the mold according to the pattern; and the stripping process of removing the photoresist, etc. However, in recent years, in the component manufacturing process of liquid crystal elements, the trend of ultra-micronization ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C11D1/66C11D3/20C11D3/60
Inventor 朱玉国
Owner 绵阳艾萨斯电子材料有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap