Protective coating suitable for CoSb3 base thermoelectric material and preparation method thereof
A technology of thermoelectric materials and protective coatings, applied in metal material coating processes, coatings, chemical instruments and methods, etc., can solve the problem of reducing the thermoelectric properties of thermoelectric materials, reducing the conversion efficiency of thermoelectric devices, and low density of protective coatings. problem, to achieve the effect of good interface bonding, reduced volatilization and good product performance
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Embodiment 1
[0031] YSZ layer, Y 2 o 3 The mass percentage is 8%, and the balance is ZrO 2 , the coating preparation method is:
[0032] CoSb 3 Polish the surface, sonicate in alcohol for 3 min, dry it and place it on the substrate, place the YSZ target and the W target in two crucibles, and then evacuate the main vacuum chamber to 10 -3 Pa; heat the substrate to 500°C, adjust the electron beam current to 2.0A, the substrate speed to 20r / min, evaporate the W target material, the deposition time is 10min, and the thickness is about 5um; then evaporate the YSZ target material at the same substrate temperature, and adjust the electron beam The flow rate is 3.0A, the deposition time is 40min, and the thickness is about 20um; after the completion, the substrate temperature is cooled to 100°C, and the vacuum chamber is opened to take out the sample to complete the CoSb 3 coating deposition process.
[0033] The bonding strength of the protective coating obtained in this example and the subs...
Embodiment 2
[0035] YSZ layer composition (mass percentage): 8.5%Y 2 o 3 , the balance being ZrO 2 , the coating preparation method is: with Sn 0.2 co 4 Sb 12 As the substrate, its surface was polished, ultrasonicated in alcohol for 5 min, dried and placed on the substrate, the YSZ and W targets were placed in two crucibles, and the vacuum was evacuated to 10 -3 Pa; heat the substrate to 520°C, adjust the electron beam current to 1.0A, the substrate speed to 10r / min, evaporate the W target material, the deposition time is 20 min, and the thickness is about 10um; then evaporate the YSZ target material at the same substrate temperature, adjust The electron beam current is 3.0A, the deposition time is 80 minutes, and the thickness is about 40um; after the completion, when the substrate is cooled to 100°C, open the vacuum chamber to take out the sample to complete the CoSb 3 Coating deposition process.
[0036] The bonding strength of the protective coating obtained in this example and t...
Embodiment 3
[0038] YSZ layer composition (mass percentage): 10%Y 2 o 3 , the balance being ZrO 2 . The coating preparation method is: with In 0.1 co 4 Sb 12 As the substrate, its surface was polished, ultrasonically cleaned in alcohol for 5 min, dried and placed on the substrate in the working room, YSZ and W targets were placed in two crucibles, and the vacuum was evacuated to 10 -3 Pa; then heat the substrate to 550°C, adjust the electron beam current to 2.0A, the substrate speed to 15r / min, evaporate the W target material, the deposition time is 40 min, and the thickness is about 20um; then evaporate the YSZ target material at the same substrate temperature, Adjust the electron beam current to 3.0A, the deposition time is 200min, and the thickness is about 100um; after the completion, keep the vacuum state, and when the temperature cools down to 100°C, open the vacuum chamber to take out the sample to complete the CoSb 3 Coating deposition process.
[0039] The bonding strength ...
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