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Method for preparing two-stage micron-submicron microstructure on surface of titanium alloy dental implant

A technology of dental implants and titanium alloys, used in implants, dentistry, prosthetics, etc.

Inactive Publication Date: 2012-07-04
JILIN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, implant surface roughening methods include titanium slurry coating (TPS), hydroxyapatite coating (HA), etc. These methods make the implant surface rough, but without characteristic surface morphology and geometric structure, and Detachment of the coating due to insufficient adhesion strength of the micron-sized coating leads to planting failure

Method used

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  • Method for preparing two-stage micron-submicron microstructure on surface of titanium alloy dental implant
  • Method for preparing two-stage micron-submicron microstructure on surface of titanium alloy dental implant
  • Method for preparing two-stage micron-submicron microstructure on surface of titanium alloy dental implant

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] (1) After the surface of the titanium alloy dental implant is activated (in hydrofluoric acid 29g / L and nitric acid 334g / L), the surface forms a uniform and regular micro-rough surface; Sonicated in deionized water, dried; see figure 1 , image A is ×500, and image B is ×2000.

[0023] (2) Electrode settings: the anode is a titanium alloy dental implant, and the cathode is a platinum sheet;

[0024] (3) Put the activated titanium alloy dental implant in the electrolyte (HCl 99g / L, HF 51g / L, NH 4 F 15g / L) for electrolytic etching treatment; treatment parameters: solution temperature 20°C, treatment time 1min, current density 300mA / cm 2 ; ultrasonically cleaned, dried; see figure 2 , Image A is ×27, Image B is ×2000, and Image C is ×4000.

[0025] (4) Place the micron-sized titanium alloy dental implant in HNO 3 (246g / L) for AC corrosion treatment, the treatment parameters are: voltage 4V, etching time 30s; acetone, 95% ethanol, deionized water ultrasonic cleaning, ...

Embodiment 2

[0027] (1) After the surface of the titanium alloy dental implant is activated (in hydrofluoric acid 29g / L and nitric acid 334g / L), the surface forms a uniform and regular micro-rough surface; Ultrasonic cleaning in deionized water, drying;

[0028] (2) Electrode settings: the anode is a titanium alloy dental implant, and the cathode is a platinum sheet;

[0029] (3) Put the activated titanium alloy dental implant in the electrolyte (HCl 108g / L, HF 61g / L, NH 4 F20g / L) for electrolytic etching treatment; processing parameters: solution temperature 22 ℃, processing time 1.5min, current density 250mA / cm 2 ; Ultrasonic cleaning, drying;

[0030] (4) Place the micron-sized titanium alloy dental implant in HNO 3 (220g / L) for AC corrosion treatment, the treatment parameters are: voltage 6V, etching time 20s; ultrasonic cleaning, drying; surface formation with micron-submicron microstructure, micron-level structure diameter is 2-5μm; sub-micron level 0.1-0.7 μm in diameter; see ...

Embodiment 3

[0032] (1) After the surface of the titanium alloy dental implant is activated (in hydrofluoric acid 29g / L and nitric acid 334g / L), the surface forms a uniform and regular micro-rough surface; Ultrasonic cleaning in deionized water, drying;

[0033] (2) Electrode settings: the anode is a titanium alloy dental implant, and the cathode is a platinum sheet;

[0034] (3) Put the activated titanium alloy dental implant in the electrolyte (HCl 109g / L, HF 60g / L, NH 4 F 25g / L) for electrolytic etching; processing parameters: solution temperature 18°C, processing time 1min, current density 80mA / cm 2 ; Ultrasonic cleaning, drying;

[0035] (4) Place the micron-sized titanium alloy dental implant in HNO 3 (270g / L) for AC corrosion treatment, the treatment parameters are: voltage 2V, etching time 30s; ultrasonic cleaning, drying; so that the surface of the test piece forms a micro-submicron microstructure, and the diameter of the micron-scale structure is 2-5μm; Submicron 0.1-0.7 μm i...

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Abstract

The invention discloses a method for preparing a two-stage micron-submicron microstructure on the surface of a titanium alloy dental implant. The titanium alloy implant is activated, and is processed through surface modification such as direct current electrolytic etching and alternating current etching, so that a two-stage micron-submicron microstructure shape can be formed on the surface of the implant. The two-stage micron-submicron microstructure shape is prepared on the surface of the titanium alloy dental implant, so that the method achieves the property of guiding the adhesion of osteoblasts, can simulate natural histomorphology in vivo, can guide the bone matrix formation on the surface rapidly, and can promote the formation of good synosteosis. Therefore, the titanium alloy dental implant can promote the formation of new bones, can short the healing time, and can achieve the ideal effect that the titanium alloy dental implant can take on the recovery function as soon as being implanted further.

Description

technical field [0001] The invention relates to an artificial tooth root implant containing a microstructure, in particular to a method for preparing a micron-submicron dual-level microstructure on the surface of a titanium alloy dental implant. Background technique [0002] With the increasing clinical application of implant dentures, the increasingly prominent clinical problem is that the healing time after the first-stage implantation is still long, which causes great inconvenience and psychological impact on the life and work of patients. Therefore, improving the bone healing speed of the implant, shortening the bone healing time after the primary operation, and accelerating the formation of the osseointegration interface, early repair has received extensive attention from scholars. [0003] A large number of clinical and experimental studies have proved that pure titanium implants with rough surfaces have greater advantages in osseointegration rate, osseointegration are...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A61C8/00
Inventor 孟维艳周延民蔡青杨立明张艳靖
Owner JILIN UNIV
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