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Film vapor deposition device and application method thereof

A vapor deposition and thin film technology, which is applied in gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of random direction, uncontrollable, weakened magnetization energy of strong magnetic field, etc., and achieves simple preparation process and realization of layer The effect of layer growth

Active Publication Date: 2013-10-16
NORTHEASTERN UNIV LIAONING
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the particles emitted by the vacuum evaporation source are mostly on the micron scale with large sizes, random and uncontrollable directions, and it is impossible to grow alloy films with precise ratios and achieve layer-by-layer growth, etc., which limits its application in the field of nano-film research. application
Moreover, due to the influence of the strong magnetic field on the current of the heating resistor, vacuum evaporation is limited to the study of the growth of low melting point metals (such as Zn, Te)
In addition, in the above studies, the strong magnetic field either indirectly acts on the process of particle growth into a continuous film, or the effect of the magnetization energy of the strong magnetic field is weakened due to the larger particle size and the smaller magnetic moment.
It is not conducive to in-depth study of the effect of strong magnetic field on the evolution of nanoparticle structure during film growth, and the influence of strong magnetic field on film growth process and structure

Method used

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  • Film vapor deposition device and application method thereof
  • Film vapor deposition device and application method thereof
  • Film vapor deposition device and application method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] Embodiment 1: First, the Fe particle source material 4-5 with a particle size of 1-3mm and a purity of 99.99% and the Ni particle source material 4-5 with a purity of 99.9999% are placed in two beam source crucibles 4-2 respectively , and then place a quartz substrate with a size of 20×20mm and a thickness of 0.9mm on the sample stage 3-11, close the movable baffle plate 3-10 of the sample stage, and open the cooling water jacket 2-6 of the coating chamber cavity and the beam source cooling Device 4-3, and then evacuated to make the vacuum of the coating chamber 4.9×10 -6 After Pa, the beam source is heated by the beam source heating coil 4-4, and the beam source temperature is measured by the beam source temperature measuring thermocouple 4-9. The beam source temperature of the material is 1400°C, and the temperature of the substrate is controlled by the sample stage cooling system 3-3, the sample stage cooling medium 3-7 and the sample stage heating coil 3-9, and the ...

Embodiment 2

[0035] Example 2: Using the same method as in Example 1, the temperature of the beam source containing the nickel source material is 1390 ° C, the temperature of the beam source containing the cobalt source material is 1400 ° C, and on a 15 ° C water-cooled quartz substrate, the preparation 90nm thick Co 50 Ni 50 film. The surface topography was analyzed with a Digital instruments Nanoscope III a type atomic force microscope (AFM). Such as Image 6 Shown is the AFM topography image of the film sample. It can be seen from the figure that the grains of the film are finely refined, and the strong magnetic field can achieve the purpose of refining the grains of the alloy film.

Embodiment 3

[0036] Embodiment 3: Firstly, the Fe particle source material 4-5 with a particle size of 1-3mm and a purity of 99.99% and the Co particle source material 4-5 with a purity of 99.9999% are respectively placed in two beam source crucibles 4-2 , and then place a quartz substrate with a size of 10×10mm and a thickness of 0.1mm on the sample stage 3-11, close the movable baffle plate 3-10 of the sample stage, and open the cooling water jacket 2-6 of the coating chamber cavity and the beam source cooling Device 4-3, and then evacuated to make the vacuum of the coating chamber 4.8×10 -6 After Pa, the beam source is heated by the beam source heating coil 4-4, and the beam source temperature is measured by the beam source temperature measuring thermocouple 4-9. The beam source temperature of the material is 1400°C, and the substrate temperature is controlled by the sample stage heating coil 3-9. The substrate temperature is 700°C. After the source temperature and the substrate tempera...

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Abstract

The invention relates to the technical field of vapor deposition, particularly a film vapor deposition device and an application method thereof. The method comprises the following steps: putting a source material into a beam source crucible, putting a substrate on a sample table, closing a sample table movable baffle, starting a filming chamber cooling water jacket and a beam source cooler, vacuumizing, heating the beam source by a beam source heating coil, measuring the temperature of the beam source by using a beam source temperature thermocouple, and controlling the temperature of the substrate through a sample table cooling system and a sample table cooling medium or sample table heating coil; when the magnetic field intensity reaches the requirement, opening the beam source movable baffle, and starting to grow the film; when the film grows to the thickness of 35-120nm, closing the sample table movable baffle and the beam source movable baffle, shutting down the substrate cooling or heating system; and finally, after lowering the magnetic field to zero, lowering the temperature of the beam source to room temperature, shutting down the vacuumizing system, and taking out the sample.

Description

technical field [0001] The invention relates to the technical field of vapor deposition, in particular to a device for vapor deposition of thin films and an application method thereof. Background technique [0002] The thin film composed of nanoscale particles, because the scale is in the junction area of ​​atomic clusters and macroscopic objects, has surface effect, small size effect and macroscopic quantum tunneling effect, and can produce properties such as giant conductance, giant magnetoresistance effect, giant Hall effect, etc. . The performance of the film strongly depends on the size, distribution, crystal structure and orientation of the nanoparticles and the thickness and surface roughness of the film. Through the control of the composite process of nanoparticles, the film can have electrical, magnetic, optical and catalytic properties that meet the application requirements. These properties have important application values ​​in the fields of information storage,...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/24C23C16/44
Inventor 王强李国建曹永泽王晓光赫冀成
Owner NORTHEASTERN UNIV LIAONING