Photosensitive Resin Composition
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- ADEKA CORP
- Publication Date
- 2012-07-18
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The present invention relates to a photosensitive resin composition using a polysiloxane compound, and further relates to a negative photoresist (especially a permanent resist) using the photosensitive resin composition. Background technique
[0002] In recent years, research on display devices such as liquid crystal display devices and EL display devices has been extensively carried out, and electronic paper has attracted attention as one of display devices that can be driven with low power consumption. Electronic paper can be made as thin as paper, has the advantages of low power consumption and the ability to retain images even when the power is cut off, and is expected to be used in electronic books and posters. It is believed that if a plastic film is used for the display substrate of electronic paper and an organic thin film transistor is used for the driving part of the display device, it will be flexible and can display without loss of quality ...