Purifying process for graphene material of energy storing device
A graphene and device technology, which is applied in the field of impurity removal technology of graphene materials of energy storage devices, can solve the problems of reducing the self-discharge retention rate, shortening the service life of energy storage devices, short-circuiting of devices, etc., and achieves good self-discharge retention rate, The effect of reducing heavy metal content and simple and orderly process
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0023] The impurity removal process for the graphene material of the energy storage device proposed by the present invention comprises the following steps:
[0024] (1) Wash the graphene obtained by the strong alkali activation treatment with deionized water at 30 °C;
[0025] (2) Then repeatedly remove impurities and wash with 30 ℃ hydrochloric acid washing solution, the concentration is 10 wt%;
[0026] (3) Repeated washing with deionized water at 30°C;
[0027] (4) Finally, the graphene is calcined at a high temperature of 500° C. for 10 hours to obtain a high-purity graphene powder.
Embodiment 2
[0029] The basic steps of the impurity removal process for the graphene material of the energy storage device proposed by the present invention are the same as those in Example 1, but the selected components, temperature, concentration and process time are different from those in Example 1, as follows:
[0030] The temperature of the deionized water was 60°C.
[0031] The selected acidic washing solution is hydrochloric acid containing hydrogen peroxide, the temperature is 60 °C, and the concentration is 10 wt%.
[0032] The temperature of high temperature calcination is 800°C, the time is 5 hours, and the protective gas is nitrogen.
Embodiment 3
[0034] The basic steps of the impurity removal process for the graphene material of the energy storage device proposed by the present invention are the same as those in Example 1, but the selected components, temperature, concentration and process time are different from those in Example 1, as follows:
[0035] The temperature of deionized water was 80°C.
[0036] The selected acidic washing solution is a hydrochloric acid solution containing ammonium chloride, the temperature is 80 °C, and the concentration is 15 wt%.
[0037] The temperature of high temperature calcination is 1000°C, the time is 2 hours, and the protective gas is nitrogen, argon and neon.
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com