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Velvet composite cathode material and method for manufacturing same

A composite cathode and velvet technology, applied in cold cathode manufacturing, electrode system manufacturing, cathode of transit time type electron tubes, etc., can solve problems such as weakening, and achieve the effects of easy production, weakening of plasma generation, and low emission threshold.

Inactive Publication Date: 2015-05-27
SOUTHWEAT UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The purpose of the present invention is to overcome the deficiencies of the above-mentioned prior art, to provide a high current-voltage consistency in the high-current electron emission, which can effectively suppress or weaken the generation of plasma in the current emission process of the cathode material, thereby improving the efficiency of the cathode material. Velvet composite cathode with vacuum outgassing problem and inhomogeneity of material and preparation method thereof

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  • Velvet composite cathode material and method for manufacturing same
  • Velvet composite cathode material and method for manufacturing same

Examples

Experimental program
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Effect test

Embodiment 1

[0017] Embodiment 1 of the present invention: the front of the velvet cathode material is placed on the sample holder of the vacuum electron beam evaporation deposition coating instrument, and the vacuum of the deposition chamber is pumped to a vacuum degree of 3.0 × 10 -3 Pa, and heat the velvet cathode to 250 °C; start the focused electron beam to bombard the metal tungsten target in the graphite crucible, adjust the electron beam current density to 300 mA; after the electron beam continues to bombard the tungsten target for 30 minutes, turn off the focused electron beam Then turn off the vacuum system; replace the velvet cathode in the vacuum electron beam evaporation deposition coating instrument, and repeat the above steps to coat the metal tungsten film on the back of the velvet cathode to obtain a high melting point metal tungsten film - velvet composite cathode materials.

Embodiment 2

[0019] Place the front of the velvet cathode material on the sample holder of the vacuum electron beam evaporation deposition coating instrument, and pump the vacuum of the deposition chamber to a vacuum degree of 3.0 × 10 -3 Pa, and heat the swan cathode to 250 °C; start the focused electron beam to make it bombard the metal molybdenum target in the graphite crucible, and adjust the electron beam current density to 300 mA; after the electron beam continues to bombard the metal molybdenum target for 30 minutes, turn off the focusing Electron beam, then close the vacuum system; replace the velvet cathode in the vacuum electron beam evaporation deposition coating instrument, and repeat the above steps to coat the film of metal molybdenum on the back of the velvet cathode to obtain a high melting point metal molybdenum film- Velvet composite cathode material.

Embodiment 3

[0021] Fix the front of the velvet cathode material on the sample holder of the vacuum electron beam evaporation deposition coating instrument, and pump the vacuum of the deposition chamber to a vacuum degree of 1.0 × 10 -3 Pa, and heat the swan cathode to 300 °C; start the focused electron beam to bombard the metal tungsten target in the graphite crucible, adjust the electron beam current density to 250 mA; after the electron beam continues to bombard the tungsten target for 40 minutes, turn off the focused electron beam Then turn off the vacuum system; replace the velvet cathode in the vacuum electron beam evaporation deposition coating instrument, and repeat the above steps to coat the metal tungsten film on the back of the velvet cathode to obtain a high melting point metal tungsten film - velvet composite cathode materials.

[0022] figure 1 From the comparison of the SEM photos, the fibrous structure of the velvet itself is basically not changed after the metal tungste...

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Abstract

The invention relates to a velvet composite cathode material and a method for preparing the same. The velvet composite cathode material is used for high-current electron emission, and two high-melting-point metal films are plated on both the back surface and the front surface of a velvet cathode material and are plated on surfaces of fibers of the velvet cathode material. The method includes placing the velvet cathode material in a vacuum electron evaporation deposition film plating instrument; starting a focus electron beam; enabling the focus electron beam to bombard the surface of a high-melting-point metal target for 20 to 40 minutes; and naturally cooling; reversing the velvet cathode material and repeating the above steps to plate the high-melting-point metal films on the back surface and the front surface of the velvet cathode material. By the aid of the velvet composite cathode material, current-voltage consistency in an electron emission process can be improved, plasma generation is effectively suppressed or weakened during current emission of the cathode material, and accordingly problems of vacuum deflation and evenness of an existing cathode material are solved. In addition, compared with a traditional metal cathode, the velvet composite cathode material is easy to be manufactured, and has low emission threshold.

Description

technical field [0001] The invention relates to a graphite cathode material for high-current electron emission, in particular to a velvet composite cathode and a preparation method thereof. Background technique [0002] Intensive emitting cathodes are widely used in many high voltage (> 300 kV), high current (> 1 kA) electron beam drive source systems, such as high power microwave, free electron laser, high current X-ray, excimer laser Wait. The high-current emission cathode materials that are often researched and reported in the literature mainly include graphite, metal, carbon fiber, and velvet, etc. The selection of cathode materials will greatly affect the design and structure of the electron beam drive source system, and is a key link in the construction of the entire source system. One of them, especially in high-power microwave devices, is one of the most critical issues in the design and establishment of high-power microwave sources. The rapid development in ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J1/304H01J23/04H01J9/02
Inventor 王兵熊鹰
Owner SOUTHWEAT UNIV OF SCI & TECH