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Method for rapidly corroding and patterning indium tin oxide surface by using electrochemical technology

An indium tin oxide and rapid corrosion technology is applied in the field of electrochemistry to achieve the effects of cost reduction, simple operation and good corrosion effect

Inactive Publication Date: 2012-09-26
HARBIN INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Aiming at the problems existing in the existing method of corroding ITO, the present invention provides a method for realizing rapid corrosion and patterning of indium tin oxide surface by using electrochemical technology, which has the advantages of simple operation, fast speed, good corrosion effect, clear boundary and low cost.

Method used

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Examples

Experimental program
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Effect test

specific Embodiment approach 1

[0013] Specific implementation mode 1: This implementation mode realizes the rapid corrosion and patterning of the surface of indium tin oxide according to the following method:

[0014] (1) ITO surface cleaning: The ITO glass sheet is ultrasonically cleaned by ethanol and distilled water, blown dry with nitrogen, and treated by a plasma cleaner for use;

[0015] (2) The plastic sealing machine (GMP Photonex-Sync235) is set to preheat at 110°C, and the photoresist used is pressed on the ITO substrate to form a protective film through the plastic sealing machine, and the mask of the pattern used is directly placed, and after ultraviolet exposure and development, it is finalized and washed. form the desired pattern;

[0016] (3) Using electrochemical technology, using dilute hydrochloric acid as the corrosion solution, using cyclic voltammetry or chronoamperometry to corrode the exposed ITO part outside the photoresist on the ITO surface;

[0017] (4) The ITO glass sheet after ...

specific Embodiment approach 2

[0025] Specific implementation mode 2: This implementation mode realizes the rapid corrosion and patterning of the surface of indium tin oxide according to the following method:

[0026] 1) ITO cleaning: The ITO electrode was ultrasonically cleaned with ethanol for 15 minutes, and then ultrasonically cleaned with distilled water for 15 minutes. 2 Blow dry, process by plasma cleaning machine for 30s, put on heating plate at 110℃ for at least 10min.

[0027] 2) Set the plastic sealing machine (GMP Photonex-Sync235) to preheat at 110°C, stick the AM175 photoresist on the ITO substrate to form a film, place a certain pattern mask, expose and develop it with soft ultraviolet (365nm) for 2s, and immediately place it at 65 Cure on a heating plate at ℃ for 4 minutes, peel off the protective film of the photoresist itself, and use a mass percentage of 1.5%Na 2 CO 3 solution, washed after ultrasonic 8s to obtain a photoresist pattern.

[0028] 3) The AUTOLAB PGSTAT302N electrochemica...

specific Embodiment approach 3

[0030] Embodiment 3: The difference between this embodiment and Embodiment 2 is that the photoresist used is AM150, the UV exposure time is 3s, the ultrasonic cleaning time is 7s, and the heating plate is cured at 65°C for 5min. 2 CO 3 The solution mass percentage is 1%.

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Abstract

The invention relates to a method for rapidly corroding and patterning an indium tin oxide (ITO) surface by using an electrochemical technology, belonging to the fields of electrochemistry and micro-nanotechnologies. Aiming at the problem of the traditional ITO-corroding method, the method for rapidly corroding and patterning the indium tin oxide surface by using the electrochemical technology, provided by the invention, comprises the steps as follows: (1) washing the ITO surface; (2) pressing a used photoresist into a protective film on an ITO substrate by using a plastic-envelop machine, directly placing a mask of a used pattern, performing ultraviolet exposure and developing, and forming and washing to form a needed pattern; (3) corroding exposed ITO part of the photoresist on the ITO surface with diluted hydrochloric acid as a corrosive liquid by using cyclic voltammetry or chronoamperometry and the electrochemical technology; and (4) washing an electrochemically corroded ITO glass sheet by using an alkali solution, removing a protective photoresist film; and drying by using N2 to obtain a patterned ITO surface. The method for rapidly corroding and patterning the indium tin oxide surface by using the electrochemical technology has the advantages of simplicity in operation, high speed, good corrosive effect, clearness of borders, low cost and the like.

Description

technical field [0001] The invention belongs to the field of electrochemistry and the field of micro-nano technology, and relates to a method for realizing rapid corrosion of indium tin oxide (ITO) surface and patterning the ITO surface by using electrochemical technology. Background technique [0002] At present, the methods of etching ITO mainly include dry etching, physical etching and chemical etching. BrF is used in dry etching method 3 , ClF 3 Such gases have the advantages of fast corrosion speed, but have the disadvantages of certain toxicity and poor controllability. The degree of pollution by physical corrosion is small, but it is easy to cause surface inhomogeneity after corrosion. Chemical corrosion method, commonly used mainly acid as etchant, the corrosion rate at room temperature is not ideal, prone to side corrosion, the boundary part is not clear enough, it is difficult to achieve micron size corrosion, and only suitable for thinner ITO film (<1000 Ang...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C25F3/12C25F3/14G03F7/00
Inventor 韩晓军毕洪梅王磊刘丹青
Owner HARBIN INST OF TECH
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