1 results about "Micro nanotechnology" patented technology

This invention belongs to the field of micro-nano technology and electron beam lithography application technology, specifically relating to a diffraction-based waveguide electronic beam exposure method and system that balances high speed with sub-nanometer writing field stitching errors. The method includes: designing a test pattern based on an AR waveguide structure and actual task exposure time; conducting exposure experiments based on the test pattern, testing and recording the stitching error values ​​at the writing field boundaries and four corner positions, and establishing a stitching error database under different writing field correction values; obtaining a coefficient matrix and initial error through polynomial fitting based on the stitching error database under different writing field correction values; and obtaining correction variables for preset design values ​​based on the coefficient matrix and the initial error, and correcting the exposure accordingly. This invention provides an easily implemented electron beam writing field pre-calibration method that can truly meet the dual requirements of high-precision and high-efficiency exposure in industrial production.